Symposium AA: Oxide Nanoelectronics and Multifunctional Dielectrics
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- November 25-30, 2012
- Boston, Massachusetts
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Meeting Chairs:
Chennupati Jagadish, Thomas Lippert, Amit Misra, Eric Stach, Ting Xu
Many striking empirical observations and theoretical predictions in ternary and quaternary transition metal oxides indicate that they possess great promise for advanced applications. This symposium will address the unique aspects of complex oxides–strong nonlinearities, rich defect chemistry, and soft-phonon instabilities–as viable foundations for future integrated technologies. Invited talks given by leaders in the field will highlight emerging topics such as the discovery of new atomic and nanoscale oxides; advanced characterization; integration with traditional semiconductor and spintronic devices; and novel uses in logic, memory, and energy conversion and storage.
- Novel heterostructures, 2DEG, and bandgap engineering of correlated electron systems
- Physics of oxide surfaces, atomic-scale interfaces, and domains in ferroic materials (including ferroelectric, ferromagnetic, and multiferroic) Composite materials are expected to fall outside of this symposium.
- Materials design through thin-film epitaxy, heterostructure confinement, and strain effects
- Computational modeling of charge doping, order parameters, and electronic or ionic transport
- Integration of complex oxides into semiconductor and/or spintronic devices
- Ionic and electrochemical modification of oxide materials and memristive behavior
- Oxide materials for energy applications (thermoelectric, photovoltaic, and energy storage)
A tutorial complementing this symposium is tentatively planned. Further information will be included in the MRS Program that will be available online in September.
Hélène
Béa (SPINTEC, France),
Manuel Bibes (CNRS,
France),
Gustau Catalan (Univ. of
Barcelona, Spain),
Gerbrand Ceder (Massachusetts
Inst. of Technology),
Venkat Gopalan (Pennsylvania
State Univ.),
Sergei Kalinin (Oak
Ridge National Lab),
Christopher
Leighton (Univ. of Minnesota),
Jeremy
Levy (Univ. of Pittsburgh),
Lane
Martin (Univ. of Illinois, Urbana-Champaign),
Steven May (Drexel Univ.),
Dane Morgan (Univ. of Wisconsin-Madison),
Tae-Won Noh (Seoul National Univ., Korea),
Hiromichi Ohta (Nagoya Univ., Japan),
Rossitza Pentcheva (Ludwig Maximilians Univ., Germany),
Kenneth Poeppelmeier (Northwestern
Univ.),
Andrew Rappe (Univ. of
Pennsylvania),
Gilberto Ribeiros-Medeiro
(Hewlett Packard, Palo Alto),
Guus
Rijnders (Univ. of Twente, Netherlands),
Yang Shao-Horn (Massachusetts Inst. of Technology),
David Singh (Oak Ridge National Lab),
Nicola Spaldin (ETH Zurich,
Switzerland),
Ichiro Takeuchi (Univ.
of Maryland),
Ichiro Terasaki (Waseda
Univ., Japan),
Jean-Marc Triscone (Univ.
of Geneva, Switzerland),
Susan
Trolier-McKinstry (Pennsylvania State Univ.).
Peter MaksymovychOak Ridge National Laboratory
Center for Nanophase Materials Sciences
1 Bethel Valley Rd., Oak Ridge, TN 37831
Tel 865-576-5220
Fax 865-574-1753
5nm@ornl.govJames M. RondinelliDrexel University
Dept. of Materials Science and Engineering
3141 Chestnut St., Philadelphia, PA 19104
Tel 215-571-3671
Fax 215-895-6760
jrondinelli@coe.drexel.eduAnke WeidenkaffEmpa, Solid State Chemistry and Catalysis Laboratory
Überlandstr. 129, CH-8600 Dübendorf, Switzerland
Tel 41-58-765-4131
Fax 41-58-797-516883
anke.weidenkaff@empa.ch Chan-Ho YangKorea Advanced Institute of Science and Technology
Dept. of Physics
Daejeon 305-701, R. O. Korea
Tel 82-42-350-2513
Fax 82-42-350-2510
chyang@kaist.ac.kr
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