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Symposium EM6—Thin-Film TransistorsNew Materials and Device Concepts

Flexible Electronics have a large future market with promising applications in flexible displays and lighting, wearable sensors, intelligent labels, and packaging. The key component of these future electronics is the thin film transistor (TFT). For many of these novel applications, the performance of the TFTs has to be significantly enhanced beyond what is possible today, e.g. beyond amorphous silicon (a:Si) thin film transistors which is the most widely used technology so far.

This symposium will be a forum for discussion of new TFT materials, deposition technologies, and device architectures that will meet the challenges posed by new applications. Thin film semiconductor materials of interest include (but are not limited to): oxide, organic and nanostructured semiconductors, and 2D materials. New device architectures will include vertical TFTs and self-aligned TFTs, as well as more conventional formats. Abstracts describing new vapor- or solution-based low temperature processing routes to TFTs will also be welcome.

Topics will include:

  • TFT architectures
  • TFT materials - semiconductors and dielectrics
  • TFT performance, including stability
  • Novel TFT fabrication or processing approaches
  • TFTs on flexible foils
  • Thin film oxides
  • Thin film organics
  • Films of 1D or 2D materials
  • Thin film dielectrics
  • Light-emitting TFTs
  • TFTs for sensor applications

Invited Speakers:

  • Ana Arias (University of California, Berkeley, USA)
  • Michael Chabinyc (University of California, Santa Barbara, USA)
  • Gerwin Gelinck (Holst Centre, Netherlands)
  • Paul Heremans (IMEC, Belgium)
  • Tom Jackson (Penn State University, USA)
  • Hagen Klauk (Max Planck Institute Stuttgart, Germany)
  • Hans Kleemann (Novaled, Germany)
  • Shelby Nelson (Kodak, USA)
  • Andrew Rinzler (University of Florida, USA)
  • Tsuyoshi Sekitani (Osaka University, Japan)
  • Henning Sirringhaus (Cambridge University, United Kingdom)
  • Taishi Takenobu (Waseda University, Japan)
  • Jun Takeya (University of Tokyo, Japan)
  • Gerhard Troester (ETH Zurich, Switzerland)
  • Sigurd Wagner (Princeton University, USA)
  • Jana Zaumseil (University of Heidelberg, Germany)

Symposium Organizers

C. Daniel Frisbie
University of Minnesota
Department of Chemical Engineering and Materials Science
USA
612-625-0779, frisbie@umn.edu

Moon Sung Kang
Soongsil University
Department of Chemical Engineering
Republic of Korea
82-2-828-7100, mskang@ssu.ac.kr

Karl Leo
Technical University of Dresden
Institute for Applied Photophysics
Germany
49-351-463-37533, leo@iapp.de

Takao Someya
University of Tokyo
Department of Electrical Engineering
Japan