Meetings & Exhibits

• MRS Spring Meetings & Exhibits
  • 2013 MRS Spring Meeting & Exhibit
  • 2014 MRS Spring Meeting & Exhibit
  • Past Spring Meetings & Exhibits
    • 2012 MRS Spring Meeting & Exhibit
    • 2011 MRS Spring Meeting & Exhibit
      • 2011 MRS Spring Meeting Chairs
      • Abstracts
      • Advocacy/Science Policy/Government Agency Sessions
      • Awards
      • Exhibitors
      • Meeting Scene - 2011 MRS Spring Meeting - Preview
      • Meeting Scene - 2011 MRS Spring Meeting - Days 1 & 2
      • Meeting Scene - 2011 MRS Spring Meeting - Day 3
      • Meeting Scene - 2011 MRS Spring Meeting - Day 4
      • Professional Development
      • Special Events
      • Technical Sessions
      • Tutorial Sessions
    • 2010 MRS Spring Meeting & Exhibit
    • 2009 MRS Spring Meeting & Exhibit
    • 2008 MRS Spring Meeting & Exhibit
    • 2007 MRS Spring Meeting & Exhibit
    • 2006 MRS Spring Meeting & Exhibit
    • 2005 MRS Spring Meeting & Exhibit
    • 2004 MRS Spring Meeting & Exhibit
    • 2003 MRS Spring Meeting & Exhibit
    • 2002 MRS Spring Meeting & Exhibit
    • 2001 MRS Spring Meeting & Exhibit
    • 2000 MRS Spring Meeting & Exhibit
    • 1999 MRS Spring Meeting & Exhibit
    • 1998 MRS Spring Meeting & Exhibit
    • 1997 MRS Spring Meeting & Exhibit
  • International Travel Information
• MRS Fall Meetings & Exhibits
• MRS Joint Meetings
• MRS Workshop Series
• Endorsements & Co-Sponsorships
• Additional Meeting Activities
• 55th Electronic Materials Conference
• International Conference on Nitride Semiconductors (ICNS 10)
• International Symposium on Integrated Functionalities (ISIF 2013)
• MRS OnDemand®
• Meetings Calendar
• Meeting Scene®

Symposium S: Plasma-Assisted Materials Processing and Synthesis

Symposium Support
Acree Technologies Inc
Asociación de la Industria Navarra
Impact Coatings AB
Metal Estalki, S.L.
Sandvik AB

* Invited paper
 

The tutorial presents a detailed description of the elemental stages of the thin-film growth process, using plasma-based physical vapor deposition techniques and the variables controlling it, aiming to optimize the final properties of the deposited layers. The influence of the growth parameters on the microstructure of thin films will be discussed, using several theoretical models. A review of state-of-the-art high-ion flux-deposition tools, including pulsed plasma systems such as PLD, HIPIMS, and filtered cathodic arc will also be included.

Instructors:
José M. Albella
Spanish Research Council (CSIC), Spain

André Anders
Lawrence Berkeley National Laboratory
 

8:15 AM S1.1
Comparison of Transport Properties in Pulsed DC Magnetron and Ion Beam Sputtered Vanadium Oxide Thin Films Used as Imaging Layers in Infrared Microbolometers.Bharadwaja Srowthi¹, S. Kozlowski³, H. Basantani³, Myung-Yoon Lee², Jing Li¹, S. Ashok³, T. Jackson², M. Horn³ and Sami Antrazi⁴; ¹Materials Research Institute, The Pennsylvania State University, University Park, Pennsylvania; ²Electrical Engineering Department, The Pennsylvania State University, University Park, Pennsylvania; ³Engineering Science and Mechanics, The Pennsylvania State University, University Park, Pennsylvania; ⁴4Wave Inc., Sterling, Virginia.

8:30 AM S1.2
Thick Beryllium Coatings by Magnetron Sputtering.Hongwei Xu¹, Abbas Nikroo¹, Kelly Youngblood¹, Kari Morena¹, Dan Wu¹, Tim Fuller¹, Craig Alford², Jeff Hayes², Andy Detor², Morris Wang², Alex Hamza², Tony v. Buuren² and Eric Chason³; ¹General Atomics, San Diego, California; ²Lawrence Livermore National Laboratory, Livermore, California; ³Brown University, Providence, Rhode Island.

8:45 AM S1.3
Chemistry and Physical Properties of Gold Incorporated Zirconium Oxide.David Horwat¹, Thomas Gries¹ and José Luis Endrino²; ¹Institut Jean Lamour, Nancy, France; ²ICMM-CSIC, Madrid, Spain.

9:00 AM S1.4
Synthesis by Magnetron Sputtering and Functionalization by Laser Interference Irradiation of Noble Metal Oxide Thin Films.Rodolphe Catrin¹, David Horwat², Thomas Gries², Sylvie Migot², Jean-Francois Pierson², Christoph Pauly¹, Yi Hu³ and Frank Muecklich¹; ¹Materials Science and Engineering, Saarland University, Saarbrücken, Saarland, Germany; ²CP2S, UMR 7198 CNRS-Nancy-Universite-UPV-Metz, Institut Jean Lamour, Nancy, France; ³Paul Scherrer Institute, Villingen, Switzerland.

9:15 AM *S1.5
Phase and Morphological Evolution of Heterogeneous TiO2 Films Produced by Reactive Pulsed Magnetron Sputtering.Raul Gago-Fernandez¹, Andres Redondo-Cubero^2,4, Zsolt Czigany³ and Luis Vazquez¹; ¹Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cientificas, Madrid, Spain; ²Instituto de Sistemas Optoelectrónicos y Microtecnología, Universidad Politecnica de Madrid, Madrid, Spain; ³Research Institute for Technical Physics and Materials Science, Hungarian Academy of Sciences, Budapest, Hungary; ⁴ISOM and DIE, E.T.S.I. Telecomunicacion, Universidad Politecnica de Madrid, Madrid, Spain.

9:45 AM SYMPOSIUM WELCOME - BRIEF OVERVIEW OF THE SYMPOSIUM BY THE ORGANIZERS

10:00 AM BREAK

10:30 AM S1.6
RF Power Driven Lattice Dynamics Behavior of Al-doped ZnO Thin Films.Bhaskar C. Mohanty, Byeong-Kon Kim, Yeon-Hwa Jo, Deuk-Ho Yeon, Ik-Jin Choi and Yong Soo Cho; Materials Science & Engineering, Yonsei University, Seoul, Korea, Republic of.

10:45 AM S1.7
Large-area, Low-temperature Deposition of Chalcopyrite Absorbers for Thin Film Solar Cells by Reactive Magnetron Sputtering.Klaus Ellmer and Stefan Seeger; Solar Fuels, Helmholtz-Zentrum Berlin, Berlin, Germany.

11:00 AM S1.8
Effect of rf Substrate Bias on Pulsed DC Magnetron Sputtered Vanadium Oxide Thin Films for Infrared Focal Plane Arrays.Hitesh Basantani¹, Myung-Yoon Lee², Jing Li³, Bharadwaja Srowthi³, E. Dickey³, T. N. Jackson² and M. W. Horn¹; ¹Engineering Science and Mechanics, The Pennsylvania State University, University Park, Pennsylvania; ²Electrical Engineering, The Pennsylvania State University, University Park, Pennsylvania; ³Materials Research Institute, The Pennsylvania State University, University Park, Pennsylvania.

11:15 AM S1.9
Influence of Hydrogen Gas on the Synthesis and Properties of Hexagonal Boron Nitride Nanowalls Prepared by Unbalanced RF Magnetron Sputtering. Boumédiène BenMoussa¹, Christian Borschel², Jan D'Haen^1,3, Julien Barjon⁴, Marc Saitner¹, Ali Soltani⁵, Vincent Mortet^1,3, Carsten Ronning², Marc D'Olieslaeger^1,3, Hans-Gerd Boyen¹ and Ken Haenen^1,3; ¹Institute for Materials Research, Hasselt University, Diepenbeek, Limburg, Belgium; ²Institut für Festkörperphysik, Friedrich-Schiller-Universität Jena, Jena, Germany; ³Division IMOMEC, IMEC vzw, Diepenbeek, Belgium; ⁴Groupe d’Etude de la Matière Condensée (GEMaC), CNRS- Université de Versailles Saint-Quentin-en-Yvelines, Meudon, France; ⁵Institut d'Electronique de Microélectronique et de Nanotechnologie, Villeneuve d'Ascq, France.

11:30 AM *S1.10
Quasicrystals and Complex Metallic Alloys: Surface Structure and Thin Film Growth.Fournee Vincent, UMR 7198 CNRS-Nancy Universite-UPV Metz, Institut Jean Lamour, Nancy, France.
 

1:30 PM S2.1
Processing of Functional Materials for Thin Films with Controlled Thickness.Olivia Moser, Colin God, Karin Bartl and Robert Saf; Institute for Chemistry and Technology of Materials (ICTM), Graz University of Technology, Graz, Austria.

1:45 PM S2.2
Colloidal Self-assembly as A Versatile Tool for Direct Inscribing of Three-dimensional Silicon-based Photonic Lattices. Constantin A. Dutu¹, Piotr Jedrasik², Ulf Sodervall², Sorin Melinte¹ and Alexandru Vlad¹; ¹ICTEAM, Universite catholique de Louvain, Louvain-la-Neuve, Belgium; ²MC2, Chalmers University, Gothenburg, Sweden.

2:00 PM S2.3
Water Repellent Behaviors of Superhydrophobic Non-woven Fabric due to Surface Modification by Plasma.Bongsu Shin^1,2, Ho-Young Kim², Myoung-Woon Moon¹ and Kwang-Ryeol Lee¹; ¹KIST, Seoul, Korea, Republic of; ²Seoul National University, Seoul, Korea, Republic of.

2:15 PM S2.4
In-line Analysis of DBD Plasma at Atmospheric Pressure while Modifying Polymer Foil Surfaces.Andreas Heilmann¹, Sandra Guenther¹, Nico Teuscher¹, Renate Hänsel² and Andreas Kiesow¹; ¹Fraunhofer Institute for Mechanics of Materials IWM, Halle (Saale), Germany; ²Research Institute of Leather and Plastic Sheeting, Freiberg, Germany.

2:30 PM BREAK

3:00 PM S2.5
Atmospheric Plasma Deposition of Novel Coatings.Linying Cui¹, Ani Kamer¹, Liam Pingree² and Reinhold Dauskardt¹; ¹Materials Science and Engineering, Stanford University, Stanford, California; ²Chemical Technology Division, Boeing Research & Technology, Seattle, Washington.

3:15 PM *S2.6
Surface Functionalization of Polymers and DLC Materials by Plasma Treatments.Francisco Yubero, Carmen Lopez-Santos, Jose Cotrino and Agustin R. Gonzalez-Elipe; ICMSE (CSIC - U. Seville), Sevilla, Spain.

3:45 PM S2.7
Atmospheric Pressure Microwave Plasma Enhanced Coating of Carbon Nanotube Ribbons and Threads.Rutvij Kotecha¹, Mark Schulz² and Vesselin Shanov¹; ¹Chemical & Materials Engineering, University of Cincinnati, Cincinnati, Ohio; ²Mechanical Engineering, University of Cincinnati, CINCINNATI, Ohio.

4:00 PM S2.8
Silicon Nanocrystals Self-assemblies Induced by Nanosecond Laser and Atmospheric Plasma Surface Engineering in Liquid Media.Vladimir Svrcek¹, Davide Mariotti² and Michio Kondo¹; ¹National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Japan; ²Nanotechnology and Advanced Materials Research Institute (NAMRI), University of Ulster, Ulster, United Kingdom.
 

8:45 AM S3.1
Abstract Withdrawn 

9:00 AM S3.2
Solid Phase Epitaxy of Germanium on Silicon Substrates.Ruben R. Lieten^1,2,3, Quan-Bao Ma^1,3, Julian Guzman^2,4, Joel W. Ager², Eugene E. Haller^2,4 and Jean-Pierre Locquet¹; ¹Physics and Astronomy, K.U. Leuven, Heverlee, Belgium; ²Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California; ³IMEC, Heverlee, Belgium; ⁴Department of Materials Science and Engineering,  UC Berkeley, Berkeley, California.

9:15 AM S3.3
Low-temperature Synthesis of Graphene by Inductively-coupled Plasma-enhanced Chemical Vapor Deposition.Lam Van Nang, Kiran Kumar Challa, Hun-Hoe Heo and Eui-Tae Kim; Departement of Materials Science & Engineering, Chungnam National University, Daejeon, Korea, Republic of.

9:30 AM S3.4
Tin Oxide Thin Films and Nanostructures Grown by PECVD and Post-treatment by Inductively Coupled Plasma.Hui Huang, Chiew Keat Lim, Man Siu Tse and Ooi Kiang Tan; School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore, Singapore.

9:45 AM S3.5
Investigation of Plasma Treatment and Impurity Doping Effects for Copper Germanide Formation on SiO2 Substrate.Chao-An Jong¹, Wen-Fa Wu¹, Ray-Mon Wang² and Jai-Lin Tsai²; ¹National Nano Device Laboratories, Hsinchu, Taiwan; ²Institute of Materials Science and Engineering, National Chung-Hsing University, Tai-Chung, Taiwan.

10:00 AM BREAK

10:30 AM S3.6
Plasma Polymerized Amino Acids for Surface Functionalization and Nanoparticle Reduction.Kyle D. Anderson¹, Kamil Marczewski¹, Michael E. McConney¹, Srikanth Singamaneni³, Joseph M. Slocik², Jesse O. Enlow², Rachel Jakubiak², Rajesh R. Naik², Timothy J. Bunning² and Vladimir V. Tsukruk¹; ¹Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia; ²Materials and Manufacturing Directorate, Air Force Research Laboratory, Dayton, Ohio; ³Mechanical Engineering & Materials Science, Washington University, St. Louis, Missouri.

10:45 AM S3.7
Abstract Withdrawn

11:00 AM *S3.8
From Plasma Deposited Thin Films to the Preparation of Supported Oxide Nanofibers.Agustin R. Gonzalez-Elipe, Ana Borras, Manuel Macias, Romero-Gomez Pablo, Jose Cotrino and Angel Barranco; Instituto de Ciencia de Materiales de Sevilla (CSIC-Uni. Sevilla), Sevilla, Spain.

11:30 AM S3.9
Atomic Layer Deposition of Al2O3 for Top-gated Organic Transistors.Leah L. Lavery and Ana C. Arias; Palo Alto Research Center, Palo Alto, California.

11:45 AM S3.10
Nucleation and Growth of Metal Oxides on Various Metal Substrates during Plasma Assisted Atomic Layer Deposition.Ali Foroughi-Abari and Kenneth C. Cadien; CME, University of Alberta, Edmonton, Alberta, Canada.

 

1:30 PM S4.1
Improving the Tribological Properties of DLC (Fullerene-like) Films Grown by ECR-CVD with Metal Nanoparticles Incorporation.Ainhoa Pardo and Cristina Gomez-Aleixandre; Surfaces and coatings, ICMM-CSIC (Instituto de Ciencia de Materiales de Madrid), Madrid, Madrid, Spain.

1:45 PM S4.2
Selective Seeding and Growth of Nanocrystalline CVD Diamond on Non-diamond Substrates.Paulius Pobedinskas¹, Stoffel D. Janssens¹, Jorge Hernando-Garcia³, Patrick Wagner^1,2, Milos Nesladek^1,2 and Ken Haenen^1,2; ¹Institute for Materials Research, Hasselt University, Diepenbeek, Limburg, Belgium; ²Division IMOMEC, IMEC vzw, Diepenbeek, Limburg, Belgium; ³Departamento de Ingeniería Eléctrica, Electrónica, Automática y Comunicaciones, Universidad de Castilla La Mancha, Ciudad Real, Spain.

2:00 PM S4.3
Diamond, Carbon Nanowall, Graphene and Their Composite Electrodes for Electrochemical Applications.Chiuan-Yi Li¹, Waileong Chen², Yonhua Tzeng^1,2 and Chia-hao Tu³; ¹NCKU, Nanotechnology and Microsystems Engineering, Tainan, Taiwan; ²NCKU, Material Science and Engineering, Tainan, Taiwan; ³NCKU, Microelectronics, Tainan, Taiwan.

2:15 PM S4.4
Synthesis of Amorphous Silicon Carbide Films Embedded with SiC and Si Nanocrystals by Fluence-ratio Detuned PECVD.Hung-Yu Tai and Gong-Ru Lin; Institute of Photonics and Optoelectronics, and Department of Electrical Engineering, National Taiwan University, Taipei, Taiwan.

2:30 PM BREAK

3:00 PM S4.5
Control of Nanocrystalline Growth Phase and Deposition Rate through Voltage Waveform Tailoring.Erik V. Johnson¹, Pierre Alexandre Delattre² and Jean Paul Booth²; ¹LPICM-CNRS, Ecole Polytechnique, Palaiseau, France; ²LPP-CNRS, Ecole Polytechnique, Palaiseau, France.

3:15 PM *S4.6
The Role of Atomic H and Ion Bombardment during Remote and Biased PECVD of Amorphous and Crystalline Thin Films.Mauritius C. van de Sanden, Applied Physics, Eindhoven University, Eindhoven, Netherlands.

3:45 PM S4.7
High Rate Deposition of Free Standing Silicon Nanocrystals in Remote Expanding Thermal Plasma.Ilker Dogan¹, Nic J. Kramer¹, Marcel A. Verheijen¹, Katerina Dohnalova², Tom Gregorkiewicz² and Mauritius C. van de Sanden¹; ¹Applied Physics, Eindhoven University of Technology, Eindhoven, Netherlands; ²Van der Waals-Zeeman Institude, University of Amsterdam, Amsterdam, Netherlands.
 

8:30 AM *S5.1
Ion-assisted Growth of Carbon-transition Metal Nanocomposite Thin Films: From Self-organization to Spin-dependent Transport.Gintautas Abrasonis^1,2, Matthias Krause^1,3, Thomas W. H. Oates⁴, György J. Kovacs¹, Arndt Mücklich¹, Per O. A. Persson⁵, Karl-Heinz H. Heinig¹, Mark D. Tucker², Marcela M. M. Bilek² and Wolfhard Möller¹; ¹Institute of Ion Beam Physics and Materials Research, Forschungszentrum Dresden-Rossendorf, Dresden, Germany; ²University of Sydney, Sydney, New South Wales, Australia; ³Institut für Festkörperphysik, Technische Universität Dresden, Dresden, Germany; ⁴Leibniz-Institut für Analytische Wissenschaftent-ISAS-Berlin, Berlin, Germany; ⁵Linköpings University, Linköping, Sweden.

9:00 AM S5.2
Synthesis and Nanoimpact Behavior of CrAl(Si)N Coatings. Jose L. Endrino¹, Rosario Martinez², Adolfo Mosquera¹, Laura Mera³, Ibon Azkona⁴ and Flavio Soldera⁵; ¹Instituto de Ciencia de Materiales de Madrid, Cantoblanco, Spain; ²AIN-Centro de Ingeniería Avanzada de Superficies, Cordovilla, Spain; ³AIMEN, Pontevedra, Spain; ⁴METAL ESTALKI SL, Derio, Spain; ⁵Saarland University, Saarbruecken, Germany.

9:15 AM S5.3
Effect of Obliquely Deposited on Microstructure and Texture Evolution in Thermal Barrier Coatings Fabricated by Electron Beam Physical Vapor Deposition under Rotation Mode. Xingeng Lei and Hongchen Wu; Beijing Aeronautical Manufacturing Technology Research Institute, Beijing, China.

9:30 AM S5.4
Epitaxial Growth of γ-Al₂O₃ on Ti₂AlC(0001) by Reactive High-power Impulse Magnetron Sputtering.Per Eklund, Jenny Frodelius, Lars Hultman, Jun Lu, Daniel Magnfaelt and Ulf Helmersson; Dept. of Physics, Chemistry, and Biology, Linkoping University, Linkoping, Sweden.

9:45 AM BREAK

10:15 AM *S5.5
Modification of Thin Film Nanostructure for Tribological Applications.James E. Krzanowski, Mechanical Engineering, University of New Hampshire, Durham, New Hampshire.

10:45 AM *S5.6
Self-organized Nanostructures in Transition Metal Nitride Thin Films Made by PVD.Lars Hultman, Department of Physics, Linköping University, Linköping, Sweden.

11:15 AM S5.7
Ion Beam Assisted Electron Beam Vapor Deposition Technology for Thermal Barrier Coatings.Wei Gao, National Key Laboratory of Science and Technology on Power Beam Processes, Beijing Aeronautical Manufacturing Technology Research Institute, Beijing, China.

11:30 AM *S5.8
Surface Modification by Filtered Cathodic Vacuum Arc - Implications in Ultra-High Density Magnetic Recording.Kyriakos Komvopoulos, Mechanical Engineering, University of California, Berkeley, California.
 

1:30 PM *S6.1
Recent Advances in Metastable Oxide Films and Artificial Heterostructures Grown by Laser Ablation. Adrian David, Ulrike Lueders, Philippe Boullay, R. Fresard and Wilfrid Prellier; CRISMAT/UMR6508, CNRS/ENSICAEN, Caen, France.

2:00 PM *S6.2
Correlation between Titanium Oxide Microstructure and Plasma Chemistry and Energetics.Marie Paule Delplancke¹, Igor Zhirkov¹, Carlo Paternoster¹, Stanislav Mraz², Jochen M. Schneider², Stephanos Konstantinidis³ and Rony Snyders^3,4; ¹Chemicals and Materials, Université libre de Bruxelles, Brussels, Belgium; ²Materials Chemistry, RWTH Aachen University, Aachen, Germany; ³Chimie des Interactions Plasma Surface, CIRMAP, Université de Mons, Mons, Belgium; ⁴Materia Nova Research Center, Mons, Belgium.

2:30 PM BREAK

3:00 PM *S6.3
Time Resolved Optical Studies of Charge State Evolution in High Current Pulsed Arc and Magnetron Discharges.Marcela M. Bilek, Roberto Sangines de Castro, Anne Weeks-Ross, Ben Treverrow, Luke Ryves, John Pigott and David R. McKenzie; School of Physics, University of Sydney, Sydney, New South Wales, Australia.

3:30 PM S6.4
Surface Modifications by Gasless Sputtering of Copper and Nickel.Joakim Andersson, Solid State Electronics, Engineering Sciences, Uppsala, Sweden.

3:45 PM S6.5
Oxide Thin Films Prepared by Glancing Angle Deposition (GLAD) as Host for the Fabrication of Functional Hybrid Materials. Lola Gonzalez-Garcia, Juan Ramón Sanchez-Valencia, Juan Ramón Sanchez-Valencia, Pedro Castillero, Julian Parra, Ana Borras, Angel Barranco and Agustin R. Gonzalez-Elipe; Instituto de Ciencia de Materiales de Sevilla (CSIC-Uni. Sevilla), Sevilla, Spain.
 

S7.1
Structure and Properties of Nanocrystalline TiN Films by ICP Assisted Magnetron Sputtering.Sung-Yong Chun, Man-Geun Han and Kyung-In Kim; Advanced Materials Eng., Mokpo National University, Jeonnam, Korea, Republic of.

S7.2
Improvement of Stability in Gd2Zr2O7 Coating Material by Plasma-assisted Process.Kee Sung Lee¹, Dong Heon Lee¹, Tae Woo Kim¹, Yeon Gil Jung² and Ungyu Paik³; ¹School of Mechanical Engineering, Kookmin University, Seoul, Korea, Republic of; ²School of Nano&Advanced Materials Engineering, Changwon National University, Changwon, Korea, Republic of; ³Department of Energy Engineering, Hanyang University, Seoul, Korea, Republic of.

S7.3
Structural and Optical Study of ZnO Thin Films Prepared by Reactive Magnetron Sputtering.Adolfo Mosquera¹, David Horwat², Luis Vazquez¹, Patrice Miska² and Jose L. Endrino¹; ¹Surfaces and Coatings, ICMM-CSIC, Cantoblanco-UAM, Spain; ²Département CP2S, Institut Jean Lamour (UMR CNRS 7198), Nancy, France.

S7.4
Optical and Electrical Characterization of ZnO Films Co-implanted with O and As Ions.Chang Oh Kim¹, Seung Bum Yang¹, Hyoung Taek Oh¹, Suk-Ho Choi¹, K. Belay² and Rebert G. Elliman²; ¹Department of Applied Physics, Kyung Hee University, Yongin, Kyungkido, Korea, Republic of; ²Electronic Materials Engineering Department, Australian National University, Canberra, Australian Capital Territory, Australia.

S7.5
Synthesis of Nano-structured Alpha and Beta Tantalum by Magnetron Sputtering.Anahita Afshin navid and Andrea Hodge; University of Southern California, Los Angeles, California.

S7.6
Structural Characterization of Ti-In-N Films Deposited by Magnetron Sputtering. Magaret A. Nowicki¹, James E. Krzanowski¹, Luis Vazquez² and Jose L. Endrino²; ¹Mechanical Engineering, University of New Hampshire, Durham, New Hampshire; ²Instituto de Ciencia de Materiales de Madrid, Madrid, Spain.

S7.7
Transferred to S6.7 

 S7.8
Evaluation of Solid Lubricants Used in Space Mechanisms Deposited In-situ from the Plasma Phase.Jose L. Endrino¹, Andre Anders², Adolfo Mosquera¹ and Stephen V. Pepper³; ¹Instituto de Ciencia de Materiales de Madrid, Cantoblanco-UAM, Spain; ²Lawrence Berkeley National Laboratory, Berkeley, California; ³NASA Glenn Research Center, Cleveland, Ohio.

S7.9
Si Nanowire Fabricated with CF4 Plasma for Superhydrophobic Surface.Eun Kyu Her^1,2, Kyu Hwan Oh¹, Kwang-Ryeol Lee² and Myoung-Woon Moon²; ¹Materials Science and Engineering, Seoul National University, Seoul, Seoul, Korea, Republic of; ²Interdisciplinary and Fusion Technology Division, Korea Institute of Science and Technology, Seoul, Seoul, Korea, Republic of.

S7.10 

Abstract Withdrawn 

 S7.11
Long-lasting Behaviors of Superhydrophilicity on Nanostructured Si-DLC Film.Seong JIn Kim¹, Jin Woo Yi¹, Myoung-Woon Moon¹, Ho-Young Kim² and Kwang-Ryeol Lee¹; ¹Korea Institute of Science and Technology, Seoul, Korea, Republic of; ²Seoul National University, Seoul, Korea, Republic of.

S7.12
Low Power Plasma Treatment of PET Substrates to Achieve Nano/Micro Structures.Zeinab Sanaee¹, Shams Mohajerzadeh¹, Mohammad Abdolahad¹ and Faramarz S. Gard²; ¹Electrical engineering, University of Tehran, Tehran, Iran, Islamic Republic of; ²Physics, Sultan Qaboos University, Muscat, Oman.

S7.13
Abstract Withdrawn 

 S7.14
Fabrication of High Aspect Ratio Wrinkles on a Soft Polymer by GLAD.Tae-Jun Ko^1,2, Myoung-Woon Moon², Kwang-Ryeol Lee² and Kyu Hwan Oh¹; ¹Materials Science and Engineering, Seoul National University, Seoul, Korea, Republic of; ²Interdisciplinary and Fusion Technology Division, Korea Institute of Science and Technology, Seoul, Korea, Republic of.

S7.15
Chemically-induced Responsive Thermal Volume Transformation with Ultrathin PECVD Polymers.Kyle D. Anderson¹, Michael E. McConney², Rachel Jakubiak², Timothy J. Bunning² and Vladimir V. Tsukruk¹; ¹Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia; ²Materials and Manufacturing Directorate, Air Force Research Laboratory, Dayton, Ohio.

S7.16
Abstract Withdrawn 

 S7.17
Properties of Highly Dense Pulsed Filter Arc Deposited Diamond-like Carbons Containing Metal Clusters.Jaume Caro¹, Raul Bonet¹ and Jose L. Endrino²; ¹CTM Centre Tecnologic, Manresa, Spain; ²Instituto de Ciencia de Materiales de Madrid, Madrid, Spain.

 

8:00 AM S8.1/G9.1
Study of Magnetic Field Shielded Sputtering Effect as a Room Temperature High Quality ITO Thin Film Deposition Process for Plastic Microelectronic Device.You Jong Lee, YunSung Jang, JunYoung Lee and MunPyo Hong; Dept. of Display and Semiconductor Physics, Korea University, Chungnam, Korea, Republic of.

8:15 AM S8.2/G9.2
Low Temperature Transparent ITO Contacts on n-GaSb and n-InAs for Mid-IR Applications. Andreas Karsaklian dal Bosco², Jonathan Sadok², Samuel Margueron¹, Sidi Ould Saad Hamady¹, Mouad Bouirig², Jean-Claude Petit¹, Joel Jacquet^1,2 and Frederic Genty^1,2; ¹LMOPS, Metz, France; ²SUPELEC, Metz, France.

8:30 AM *S8.3/G9.3
Reactive Magnetron Sputtering of TCO Thin Films: Role of Energetic Particle (Ion) Bombardment.Klaus Ellmer and Thomas Welzel; Solar Fuels, Helmholtz-Zentrum Berlin, Berlin, Germany.

9:00 AM S8.4/G9.4
Modelling the Sputter Deposition of Thin Film Photovoltaics Using Long Time Scale Dynamics Techniques.Sabrina Blackwell¹, S. D. Kenny¹, R. Smith¹ and J. M. Walls²; ¹Department of Mathematical Sciences, Loughborough University, Loughborough, United Kingdom; ²Department of Electronic and Electrical Engineering, Loughborough University, Loughborough, United Kingdom.

9:15 AM S8.5/G9.5
RF-superimposed DC Magnetron Sputtering to Improve Amorphous Indium Zinc Oxide Transparent Conductors.Thomas Gennett, Marie C. Galante, Phillip A. Parilla, John D. Perkins and David S. Ginley; National Renewable Energy Laboratory, Golden, Colorado.

9:30 AM S8.6/G9.6
Incorporation of Al in ZnO by Pulsed Reactive Magnetron Sputtering: Electrical Properties, Film Structure and Dopant Activation.Steffen Cornelius, Mykola Vinnichenko, Andreas Kolitsch and Wolfhard Moeller; Research Center Dresden-Rossendorf, Dresden, Germany.

9:45 AM S8.7/G9.7
N-type Doping in ZnMgO: A Path Towards Conductivity-bandgap-tTunable TCO System.Yi Ke^1,2, David Ginley¹, Ryan O'Hayre², Joseph Berry¹ and Andriy Zakutayev¹; ¹National Renewable Energy Laboratory, Golden, Colorado; ²Metallurgy and Material Science Engineering Department, Colorado School of Mines, Golden, Colorado.

10:00 AM BREAK

10:30 AM S8.8/G9.8
Effects of Oxygen Plasma Treatment before, during, and after Growth of ZnO:Al by DC Cathodic Arc Deposition.Rueben J. Mendelsberg, Sunnie H. Lim, Yuankun Zhu, Delia J. Milliron and Andre Anders; Lawrence Berkeley National Laboratory, Berkeley, California.

10:45 AM S8.9/G9.9
Change in Surface Composition, Work Function and Wettability of Modified ZnO and Ultra-smooth ITO Depending on the Anchoring Group and Dipole Moment of the Small Molecule Modifier.Mariola R. Macech¹, Erin Ratcliff¹, Sergio Paniagua², Seth R. Marder², Bernard Kippelen³ and Neal R. Armstrong¹; ¹Chemistry and Biochemistry, University of Arizona, Tucson, Arizona; ²School of Chemistry and Biochemistry, Georgia Institut of Technology, Atlanta, Georgia; ³School of Electrical Engineering, Georgia Institut of Technology, Atlanta, Georgia.

11:00 AM S8.10/G9.10
High Haze and Low Resistive MgO/AZO Bi-layer Transparent Conducting Oxide for Thin Film Solar Cells.Dong-Won Kang¹, Jong-Seok Woo¹, Seung-yoon Lee², Hyun-Ja Shim², Heon-Min Lee² and Min-Koo Han¹; ¹Seoul National University, Seoul, Korea, Republic of; ²LG Electronics, Seoul, Korea, Republic of.

11:15 AM S8.11/G9.11
Al-doped ZnO Films Grown by Reactive Magnetron Sputtering: Properties Evolution and Secondary Phase Formation.Mykola Vinnichenko¹, Steffen Cornelius¹, Matthias Krause¹, Raul Gago², Frans Munnik¹, Andreas Kolitsch¹ and Wolfhard Moeller¹; ¹Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum, Dresden-Rossendorf; Dresden, Germany; ²Instituto de Ciencia de Materiales de Madrid (CSIC), Madrid, Spain.

11:30 AM S8.12/G9.12
Physical Properties of Sb-doped BaSnO3 : A New Transparent Conducting Oxide.Hyung Joon Kim, Jiyeon Kim, Woo Seok Choi, Da Woon Jeong, Jaejun Yu, Tae Won Noh and Kee Hoon Kim; Department of Physics and Astronomy, Seoul National University, Seoul, Korea, Republic of.

11:45 AM S8.13/G9.13
Investigation of Transparent Conducting Oxide Thin Films Deposited on Insulating Ceramic Materials.Ramesh M. Krishna¹, Timothy C. Hayes¹, Adrian Mendez Torres², Kyle S. Brinkman² and Krishna C. Mandal¹; ¹Department of Electrical Engineering, University of South Carolina, Columbia, South Carolina; ²Savannah River National Laboratory, Aiken, South Carolina.
 

1:30 PM *S9.1/G10.1
Polycrystalline Inverse Spinel Zn2SnOx and Sn, Hf-doped InSbO4 as Transparent Conductive Films.Yuzo Shigesato and Nobuto Oka; Graduate School of Science and Engineering, Aoyama Gakuin University, Sagamihara, Japan.

2:00 PM *S9.2/G10.2
Deposition of Transparent Conductive Oxide Films using HiPIMS.Jeff Brown and Michael McFarland; Acree Technologies Inc., Concord, California.

2:30 PM *S9.3/G10.3
P-type Transparent Conductive Oxides in the Family Ternary Co3O4-based Spinels.Andriy Zakutayev, John Perkins, Philip Parilla, David Ginley, Tula Paudel, Stephan Lany and Alex Zunger; National Renewable Energy Laboratory, Golden, Colorado.