Symposium II: Nanoscale Materials Modification by Photon, Ion, and Electron Beams
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- April 9 - April 13, 2012
- Moscone West Convention Center | Marriott Marquis - San Francisco, California-
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Meeting Chairs:
Lara A. Estroff, Jun Liu, Kornelius Nielsch, Kazumi Wada
This symposium is co-sponsored by the Japan Society of Applied Physics
Materials modification by electronic excitations using various quantum beams is gaining recognition as a family of the promising technologies with high potential for effective control of the structural arrangements at nanometer-length scales. Dramatic progress in recent years has been deepening atomic-level knowledge of the transient phenomena triggered by electronic excitations with the aid of time-resolved x-ray and electron-diffraction techniques, spectroscopy and microscopy, and computer simulations on dynamical processes.
This symposium will provide an opportunity for interdisciplinary discussion on the progress in excitation-controlled materials modification at the nanoscale (processing, patterning, fabrication, …) covering the recent theoretical and experimental advances in the study of various atomic processes in bulk, surface, and nanosystems induced by various excitations, together with new observation techniques. A focus will be on 1) the transient dynamic behaviors that govern the final relaxed configurations, and 2) the feasible methods to localize the excitation in order to obtain high spatial resolution, efficiency, and selectivity.
Cooperative discussions in the symposium will give us deep understandings on the underlying mechanisms and also show us how to achieve novel functionalities in excited materials and novel-material processes unachievable by conventional techniques, thereby establishing real fusion of bottom-up and top-down processes in nanofabrication.
- Fundamental physics and chemistry in excitation-induced processes (excluding mere thermal process)
- Processes induced by quantum beams, including laser (visible, IR, UV), x-ray, synchrotron radiation, electron beam, molecule, ion, heavy ion, multicharged ion, carrier injection, probe excitation, etc.
- Observations of ultrafast phenomena caused by excitations
- Molecular dynamics under electronic excitations
- Manipulation of atoms and molecules in solids and on surfaces
- Self-assembly, self-organization, and bottom-up processes induced by electronic excitations
- Novel reaction fields for nanofabrication
- Breakthrough in nanopatterning and lithographic processes
- Novel functions including bistability and catalyst
- Enhanced defect reaction in devices
A joint session with Symposium G: Reliability and Materials Issues of III-V and II-VI Semiconductor Optical and Electron Devices and Materials II is being considered.
A tutorial complementing this symposium is tentatively planned. Further information will be included in the MRS Program that will be available online in January.
Paolo Biagioni (Politecnico di Milano, Italy), Gérald Dujardin (LPM, France), Martin Garcia (Univ. Kassel, Germany), Wayne Hess (Pacific Northwest National Lab), Frank Hubenthal (Univ. Kassel, Germany), Jun-ichi Kanasaki (Osaka Univ., Japan), Koji Maeda (Univ. of Tokyo, Japan), Shinji Matsui (Hyogo Univ., Japan), Jiro Matsuo (Kyoto Univ., Japan), Yoshiyuki Miyamoto (AIST, Japan), Richard Palmer (Univ. of Birmingham, United Kingdom), Oleg Prezhdo (Univ. of Rochester), David Tománek (Michigan State Univ.).
Yuzo Shinozuka
Wakayama University
Faculty of Systems Engineering
930 Sakaedani, Wakayama 640-8510 Japan
Tel 81-73-457-8236, Fax 81-73-457-8237
yuzo@sys.wakayama-u.ac.jp
Toshihiko Kanayama
National Institute of Advanced Industrial Science and Technology
Tsukuba West 7
16-1 Onogawa, Tsukuba 305-8569, Japan
Tel 81-29-861-2623, Fax 81-29-849-1533
kanayama.t@aist.go.jp
Richard F. Haglund Jr.
Vanderbilt University
Dept. of Physics and Astronomy,
6301 Stevenson Center Lane
Nashville, TN 37235-1807
Tel 615-322-7964, Fax 615-343-7263
richard.haglund@vanderbilt.edu
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