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Symposium M: Optical Interconnects -- Materials, Performance, and Applications

Meetings & Exhibits

Symposium M: Optical Interconnects -- Materials, Performance, and Applications

2012 MRS Spring Meeting & Exhibit
April 9 - April 13, 2012
Moscone West Convention Center | Marriott Marquis - San Francisco, California-
Meeting Chairs: Lara A. Estroff, Jun Liu, Kornelius Nielsch, Kazumi Wada

Optical Interconnects -- Materials, Performance, and Applications

This symposium is intended to bring together materials scientists, as well as optical, mechanical, and reliability engineers to address and discuss state-of-the-art and challenges in the optical- interconnect-materials-science (OIMS) field, considering all the aspects of various types of optical interconnect design, fabrication, performance, and applications. Abstracts are sought on the physical, chemical, mechanical, electrical, and optical properties of interconnect materials and optical interfaces that are important to the manufacturability, performance, and reliability of optical interconnect systems.

Session topics will include (but will not be limited to) the following major areas:

Optical interconnect materials: optical and mechanical behavior and performance
Bare and coated optical fiber interconnects subjected to thermal and/or mechanical loading:
physical optical design for reliability
Photonic crystal fiber (PCF) interconnects
On-chip interconnects
Photonic interfaces
Board-to-board and chip-to-chip interconnects
Interconnects in micro-optic systems and integrated micro-optics
Planar light guides
3D optical signal routing on planar PC assemblies
Advanced photonic packaging materials
Interconnects in hybrid electro-optical printed circuit assemblies
Organic optical waveguides; micro-optic components and devices
Polymers for integrated optics and interconnects
Organic optical interconnects for harsh environmental applications
Flexible optical interconnects
High-density optical interconnects
Free-space optical interconnections
Adhesives in optical interconnect technologies and their performance
Optical nonlinearities: utilization, characterization, causes, use for detection, signal processing, modulation of light signal at very rapid signal rates, etc.
Optical materials nonlinearities (including those leading to degradation of useful optical properties at high light amplitudes)

Invited speakers (partial list) include:

Philippe Absil (IMEC, Belgium): Silicon Photonics Technology; Slavisa Aleksic (Technical Univ., Vienna, Austria): Large-scale Intrasystem Optical Interconnects; Solomon Assefa (IBM T.J. Watson Research Ctr.): Silicon Nanophotonics Integration with CMOS; Mark Brongersma (Stanford Univ.): Nano-photonics and Plasmonics; Ray Chen (Univ. of Texas, Austin): Opto-electronic Interconnects; Doug Coleman (Corning, Inc.): State-of-the-Art and Challenges in Optical Interconnect Technologies; Jack Cunningham (Sun Microsystems): Next Generations of Optical Interconnects; Alexey Glebov (Optigrate): Micro-optic Interconnects; Claire Gu (Univ. of California, Santa Cruz): Nanophotonic Interconnects; Tetsuo Sato (Nissan Chemical, Japan): Optical Interconnect Materials; Jurgen Stampfl (Vienna Univ. of Technology, Austria): Photopolymer-based Interconnects for Biomedical Applications; Sönke Steenhusen (Fraunhofer ISC, Germany): Optical Inter-connects by 3D Lithography; Hiren Thacker (Oracle, San Diego): Nanophotonic Intercon-nects and Optical Interconnects on Chip; Peter van Daele (IMEC, Belgium): Interconnects in Flexible Optics.

Symposium Organizers

Ephraim Suhir
University of California
Baskin School of Engineering
Dept. of Electrical Engineering
1156 High St.
Santa Cruz, CA 95064
Tel 650-969-1530, Fax 650-968-4611
suhire@aol.com

David Read
National Institute of Standards and Technology
MS 853.05
325 Broadway
Boulder, CO 80305
Tel 303-497-3853, Fax 303-497-5030
read@boulder.nist.gov