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Atom-probe tomography is in the midst of a dynamic renaissance. Robust commercial instruments are now capable of collecting large data sets for hundreds of millions of atoms in short time periods. The setup involves a field-ion microscope coupled directly to a time-of-flight mass spectrometer, enabling layer-by-layer characterization on the atomic scale. Advanced software can then reconstruct these data sets to understand the composition with atomic-level resolution in three-dimensions. This issue examines application of these techniques to metallic, semiconducting, ceramic, and organic materials.

On the Cover | Masthead

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Introductory Article: An Atom-Probe Tomography Primer.
David N. Seidman and Krystyna Stiller, Guest Editors

Theme Article - Structural Materials: Understanding Atomic-Scale Microstructures 725-730
Emmanuelle A. Marquis, Michael K. Miller, Didier Blavette, Simon P. Ringer, Chantal K. Sudbrack, and George D.W. Smith

Theme Article - Atom-Probe Tomographic Studies of Thin Films and Multilayers 732-737
David J. Larson, Alfred Cerezo, Jean Juraszek, Kazuhiro Hono, and Guido Schmitz

Theme Article - Atom-Probe Tomography of Semiconductor Materials and Device Structures 738-743
Lincoln J. Lauhon, Praneet Adusumilli, Paul Ronsheim, Philip L. Flaitz, and Dan Lawrence

Theme Article - Prospects for Nanobiology with Atom-Probe Tomography 744-749
Thomas F. Kelly, Osamu Nishikawa, J.A. Panitz, and Ty J. Prosa

Technical Feature - Manipulation of Photons by Photonic Crystals
2008 IUMRS-ICEM Meeting Plenary Address 751-755
Susumu Noda