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• printer-friendly

Author(s):
R. Mu, M. H. Wu, Y. C. Liu, A. Ueda, D. O. Henderson, A. B. Hmelo, L. C. Feldman, A. Hepp

Pico-second pulsed laser deposition (PLD) was employed to fabricate copper indium disulfide (CIS) thin films on pure silica and the Mo coated glass substrates. By properly preparing the target materials and controlling the elemental ratio of the Cu, In and S in the deposited film followed by post-thermal annealing, good quality of CIS films can be obtained. A series of characterizations were conducted including XRD, RBS, IR, UV-Vis, AFM and STM analyses.

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Paper #: V3.4
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