2018 MRS Spring Meeting

Call for Papers

Late Breaking Abstract Submission Closed
January 11, 2018 (11:59 pm ET)

Symposium MA03—Directed Matter—Atom-by-Atom Assembly with Electron Beams and Scanning Probes

The rise of nanotechnology was heralded by the experiments by Don Eigler (IBM), who used the scanning probe microscope (SPM) tip to manipulate xenon atoms on metal surfaces. Over the following 25 years, SPM manipulation of atoms and molecules advanced dramatically, addressing a wide variety of surface bound material systems with exquisite precision and demonstrating significant technological and scientific milestones. As a tool for arbitrary construction of atomically precise structures, the 2D nature of SPM manipulation and the speed limitations inherent in moving macroscopic physical tip still limit the application of the expanding toolset to relatively small 2D structures. Concurrently, electron microscopy emerged as a reliable and widespread tool, routinely offering atomically resolved images. Unlike SPM, electron microscopy has long been perceived as purely an imaging tool, with beam induced modifications in material structure considered as a hindrance, to be minimized by a proper choice of imaging conditions or beam energy. However, in the last 5 years, it was demonstrated that the electron beam can induce subtle and controllable changes in material structure, including chemical transformations of layered materials, chemical bonding between adsorbed molecules and substrates, crystallization of vacancy planes in oxides, controlled atomic dynamic of interstitial atoms, and single vacancy formation in layered materials. Combined with the development of beam control electronics, big data acquisition and analytic tools, and AI feedback systems, this puts electron microscopy at the brink of a transition from a pure imaging tool to one capable of creating structures with atomic precision and high throughput, the long-held ultimate dream and possibly a final frontier of the nanoscience. If established, the field is poised for rapid growth enabled by thousands of extant STEM platforms. Rapid realization of these opportunities necessitates initiating an interdisciplinary research effort combining the electron microscopy, data analytics/image analysis, and electrical engineering communities, as well as stringent attention to materials science aspects of these phenomena. Researchers in fields which require atomically precise structures will benefit from recent developments in both scanning probe and electron beam based atom manipulation. The proposed symposium will bring together the experts in scanning probe atomic fabrication and atomically resolved electron beam studies, bring these advances and opportunities to the attention of materials research communities, and serve as a much-needed seed to establish the rapid growth of atomically precise technologies.

Topics will include:

  • Electron beam induced dynamics of vacancies and interstitials
  • Beam induced reactions and phase transitions on atomic level
  • Covalent chemistry of layered materials
  • Beam-matter interactions from nanoseconds to hours
  • Chemistry and physics in small volumes
  • Mechanisms and fundamental science of STM and AFM atomic manipulation
  • Non-equilibrium reaction pathways
  • Novel machine learning and crowdsourcing tools for reaction predictions
  • A tutorial complementing this symposium is tentatively planned.

Invited Speakers:

  • Karl Berggren (Massachusetts Institute of Technology, USA)
  • Matthias Bode (Universitat Wuerzburg, Germany)
  • Albina Borisevich (Oak Ridge National Laboratory, USA)
  • Zhenchao Dong (University of Science and Technology of China, China)
  • Hongjun Gao (Institute of Physics, China)
  • Franz Giessibl (Universitat Regensburg, Germany)
  • Cyrus Hirjibehedin (University College London, United Kingdom)
  • Ryo Ishikawa (University of Tokyo, Japan)
  • Ute Kaiser (Ulm University, Germany)
  • Junhao Lin (National Institute of Advanced Industrial Science and Technology, Japan)
  • Joe Lyding (University of Illinois at Urbana-Champaign, USA)
  • Tjerk Oosterkamp (Universiteit Leiden, Netherlands)
  • Sander Otte (Delft University of Technology, Netherlands)
  • Michelle Simmons (University of New South Wales, Australia)
  • Toma Susi (University of Vienna, Germany)
  • Peter Sutter (University of Nebraska–Lincoln, USA)
  • Alex Zettl (University of California, Berkeley, USA)
  • Haimei Zheng (Lawrence Berkeley National Laboratory, USA)

Symposium Organizers

Sergei V. Kalinin
Oak Ridge National Laboratory
Institute for Functional Imaging of Materials
865-241-0236, sergei2@ornl.gov

Jeremy Barton
Nanofactory Corporation

Mitra Taheri
Drexel University
Department of Materials Science and Engineering

Wu Zhou
University of Chinese Academy of Sciences
School of Physical Sciences
86-10-8264-8048, wuzhou@ucas.ac.cn

Keywords for Abstract Submission

atomic assembly, beam-matter interactions, electron beam fabrication, nanotechnology, scanning probe fabrication