Symposium TC03—Emerging Prospects and Capabilities in Ion Beam Technology and Applications

This symposium will focus on finely focused ion beam technologies and novel ion sources, with an emphasis on Gas Field Ion Sources (GFIS), Liquid Metal Ion Sources (LMIS), high-brightness plasma ion sources, and other emerging ion source concepts in order to provide a forum for researchers interested in a wide range of ion beam technologies and applications. Ion beam based tools offer a highly diverse set of capabilities in imaging, nanofabrication and spectroscopy. Some notable examples include visualization of conductive and highly insulating samples (without specialized sample prep treatment) at single nanometer resolution. Furthermore, the same tool can be utilized for surface patterning and nanofabrication with extreme precision, and virtually no sample contamination. Finally, novel in-situ combinatorial techniques, coupling ion beams to Secondary Ion Mass Spectrometry (SIMS) and Scanning Probe Microscopy (SPM) offer new routes for exploring and quantifying materials at the nanoscale. Progress in LMIS based technology, which continues to be an active field of research and is often used in combination with GFIS, as well as newly emerging ion source technologies, will also be discussed.

This symposium will cover a broad range of topics associated with this emerging field, with particular focus on frontiers in nanofabrication and milling, direct-write in liquid and gas environments, imaging, and novel multimodal capabilities for process control and material study. A broad range of materials, including 2D materials, semiconductors, polymers, construction materials, and other industrially relevant compounds – pertinent to basic research and applied science, will be presented and discussed.

Interdisciplinary topic narrative related to material science, chemistry and physics will be woven into the symposium through an underlying discussion of material surface and bulk properties as probed by finely focused ion beams. Additionally, a poster session will be held to present some of the newest results and expound on findings and tool designs.

Topics will include:

  • Pushing the limits of nanofabrication
  • Direct-write technology
  • High resolution imaging and imaging of “difficult” materials
  • New experiments with ions
  • Multimodal data analysis
  • Development of new capabilities and tools
  • A tutorial complementing this symposium is tentatively planned.

Invited Speakers:

  • Paul Alkemade (Delft University of Technology, Netherlands)
  • Jean-Nicolas Audinot (Luxembourg Institute of Science and Technology, Luxembourg)
  • Silke Christiansen (Helmholtz Zentrum Berlin, Germany)
  • Shane Cybart (University of California, Riverside, USA)
  • Anne Delobbe (Orsay Physics, France)
  • Gregor Hlawacek (Helmholtz-Zentrum Dresden-Rossendorf, Germany)
  • Reo Kometani (University of Tokyo, Japan)
  • Jabez McClelland (National Institute of Science and Technology, USA)
  • Lisa McElwee-White (University of Florida, USA)
  • Andrew Minor (Molecular Foundry, Lawrence Berkeley National Laboratory, USA)
  • Hans Mulders (FEI Netherlands, Netherlands)
  • John Notte (Carl Zeiss, USA, USA)
  • Olga Ovchinnikova (Oak Ridge National Laboratory, USA)
  • Conny Rodenbourg (University of Southampton, United Kingdom)
  • Ferdinand Schmidt-Kaler (Universität Mainz, Germany)
  • Shida Tan (Intel Corporaion, USA)
  • Anto Ysaka (Hitachi Corporation, Japan)

Symposium Organizers

Alex Belianinov
Oak Ridge National Laboratory
Center for Nanophase Materials Sciences

Frances Allen
University of California, Berkeley
Department of Materials Science and Engineering

Shinichi Ogawa
National Institute of Advanced Industrial Science and Technology
Nanoelectronics Research Institute

Tom Wirtz
Luxembourg Institute of Science and Technology (LIST)
Advanced Instrumentation for Ion Nano-Analytics (AINA)