2019 MRS Fall Meeting & Exhibit

Symposium FF05 : Advanced Atomic Layer Deposition and Chemical Vapor Deposition Techniques and Applications

2019-12-02   Show All Abstracts

Symposium Organizers

Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS

Symposium Support

Gold
GVD Corporation
Lam Research Corp

Silver
Specialty Coating Systems

Bronze
Waterloo Institute for Nanotechnology
FF05.01: Theoretical and Experimental Advances in ALD/CVD Chemistry I
Session Chairs
David Bergsman
Graziella Malandrino
Monday AM, December 02, 2019
Hynes, Level 3, Room 310

8:15 AM -
Welcome and Introduction


8:30 AM - FF05.01.01
DFT Study on Atomic Layer Deposition of Cobalt and Ruthenium on NHx-Terminated Nitrogen Plasma Treated Metal Surfaces

Ji Liu1,Michael Nolan1

Tyndall National Institute1

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8:45 AM - FF05.01.02
Multi-Scale Modelling and Experimental Analysis of ALD Alumina—Interplay of Process Dynamics, Chemistry and Interfacial Phenomena

Constantin Vahlas4,Giorgos Gakis1,Emmanuel Scheid2,Hugues Vergnes3,Andreas Boudouvis1,Brigitte Caussat3

National Technical University of Athens1,LAAS2,Institut National Polytechnique de Toulouse3,CNRS4

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9:00 AM - FF05.01.03
CVD and ALD Processes from an Ab Initio Perspective

Ralf Tonner1

University of Marburg1

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9:30 AM - FF05.01.04
Development of Selenium Containing Single Source Precursors for the AACVD of SnSe and ZnSe Thin Films

Emily Taylor1,2,Ibrahim Ahmet3,Andrew Johnson1

University of Bath1,Centre for Sustainable Chemical Technologies2,Helmholtz-Zentrum Berlin3

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9:45 AM - FF05.01.05
van der Waals Epitaxy of VO2 Crystals on Layered Hexagonal Boron Nitride

Saloni Pendse1,Jian Shi1

Rensselaer Polytechnic Institute1

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10:00 AM -
BREAK


10:30 AM - FF05.01.06
Design Rules for Atomic Layer Deposition Precursors and Why You Should Break Them

Sean Barry1

Carleton University1

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11:00 AM - FF05.01.07
Influence of Precursor Chemistry on Phase, Morphology and Composition of CVD Grown Metal Oxide and Noble Metal Nanostructured Films

David Graf1,Michael Frank1,Lasse Jurgensen1,Aida Jamil1,Isabel Gessner1,Sanjay Mathur1

University of Cologne1

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11:15 AM - FF05.01.08
Reactivity of Atomic Layer Deposition Precursors with OH/H2O-Containing Metal Organic Framework Materials

Kui Tan1,Stephanie Jensen2,Liang Feng3,Jing Li4,Hongcai Zhou3,Timo Thonhauser2,Yves Chabal1

The University of Texas at Dallas1,Wake Forest University2,Texas A&M University3,Rutgers, The State University of New Jersey4

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11:30 AM - FF05.01.09
Enumeration as a Computational Strategy for Automating the Design of CVD and ALD Precursors

Simon Elliott1,David Giesen1,H. Kwak1,Mathew Halls1

Schrödinger Inc1

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FF05.02: Theoretical and Experimental Advances in ALD/CVD Chemistry II
Session Chairs
Sean Barry
Ralf Tonner
Monday PM, December 02, 2019
Hynes, Level 3, Room 310

1:30 PM - FF05.02.01
Atomic Layer Deposition of Zinc-Doped Alumina at Room-Temperature for Organic Opto-Electronics

Shiv Bhudia1,Sabrina Wack1,Noureddine Adjeroud1,Jérôme Guillot1,Renaud Leturcq1

Luxembourg Institute of Science and Technology1

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1:45 PM - FF05.02.02
Hydrogen-Free CVD of WSe2 Monolayers from Inorganic-Se Precursors

Mauro Och1,Pawel Palczynski1,Giulia Zemignani1,2,Evgeny Alexeev3,Alexander Tartakovskii3,Cecilia Mattevi1

Imperial College London1,Politecnico di Milano2,The University of Sheffield3

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2:00 PM - FF05.02.03
Engineering of Molecular Architectures of Metal Precursors for Vapor Phase Routes to Energy Harvesting and Energy Conversion Systems

Graziella Malandrino1,2,Nishant Peddagopu1,2,Anna Pellegrino1,2

Universita' degli Studi di Catania1,INSTM2

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2:30 PM - FF05.02.04
Chemical Vapor Deposition of Cuprous Halide Thin Films

Christina Chang1,Luke Davis1,2,Roy Gordon1

Harvard University1,Tufts University2

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2:45 PM - FF05.02.05
Facile Synthesis of Nickel Sulfide Millimeter Long Nano-Arrows (Ni3S2) Using Chemical Vapor Deposition

Pola Shriber1,Rimon Tamari2,Maria Tkachev1,Sharon Bretler2,Louisa Meshi2,Gilbert Nessim1

Bar Ilan University1,Ben-Gurion University of the Negev2

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3:00 PM -
BREAK


3:30 PM - FF05.02.06
Prospects for Nanostructuring Ultrathin Organic and Hybrid Films via Molecular Layer Deposition

David Bergsman1,2,Richard Closser2,Christopher Tassone3,Bruce Clemens2,Dennis Nordlund3,Stacey Bent2

Massachusetts Institute of Technology1,Stanford University2,SLAC National Accelerator Laboratory3

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4:00 PM - FF05.02.07
Growth and Characterization of Orthorhombic ε-Ga2O3 Thin Films Fabricated via Mist Chemical Vapor Deposition Technique

Daisuke Tahara1,Hiroyuki Nishinaka1,Yuta Arata1,Kazuki Shimazoe1,Yusuke Ito1,Minoru Noda1,Masahiro Yoshimoto1

Kyoto Institute of Technology1

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4:15 PM - FF05.02.08
Tensile Properties of ALD Alumina without Substrate Measured by Tensile Testing on Water Surface

Sangmin Lee1,Junmo Koo2,Junmo Kim1,Joon-Hyung Shim2,Taek-Soo Kim1

Korea Advanced Institute of Science and Technology (KAIST)1,Korea University2

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4:30 PM - FF05.02.09
Characterizing Ultra-Thin Layers Using High Resolution Low Energy Ion Scattering (LEIS)

Thomas Grehl1,Philipp Brüner1,Nathan Havercroft2

IONTOF GmbH1,ION-TOF USA, Inc.2

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2019-12-03   Show All Abstracts

Symposium Organizers

Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS

Symposium Support

Gold
GVD Corporation
Lam Research Corp

Silver
Specialty Coating Systems

Bronze
Waterloo Institute for Nanotechnology
FF05.03: Theoretical and Experimental Advances in ALD/CVD Chemistry III
Session Chairs
Kevin Musselman
Greg Randall
Tuesday AM, December 03, 2019
Hynes, Level 3, Room 310

8:30 AM - FF05.03.01
The Source of the p-Type Doping in the Transparent and Highly Conductive Cu0.66Cr1.33O2 Thin Films Deposited by Dynamic Liquid Injection (DLI)-MOCVD

Petru Lunca-Popa1,Mounib Bahri2,Jacques Botsoa3,Renaud Leturcq1,Jonathan Crepelliere1,Jean-Nicolas Audinot1,Tom Wirtz1,Didier Arl1,Ovidiu Ersen2,Marie-France Barthe3,Damien Lenoble1

Luxembourg Institute of Science and Technology1,Institut de Physique et Chimie des Matériaux de Strasbourg (IPCMS), UMR CNRS – Université de Strasbourg2,CEMHTI-CNRS, Centre National de la Recherche Scientifique UPR 3079, Orleans3

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8:45 AM - FF05.03.02
Flash Evaporation of Low Volatility Solid Precursors by a Scanning Infrared Laser

Jeremias Geiss1,Markus Winterer1

University of Duibsurg-Essen1

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9:00 AM - FF05.03.03
Filling Nanocavities with Methods Based on Capillary Condensation and Vapor Phase Infiltration

Ville Lovikka1,Markku Leskelä1

University of Helsinki1

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9:15 AM - FF05.03.04
Flexible Gas Barrier Coatings for Advanced Applications with Chemical Vapor Deposition

Christopher Thompson1,William O'Shaughnessy1

GVD Corporation1

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9:30 AM - FF05.03.05
In Situ Characterization of Metal Oxide Films Produced Using Atmospheric Pressure Spatial ALD

Alexander Jones1,Kissan Mistry1,Manfred Kao1,Mustafa Yavuz1,Kevin Musselman1

University of Waterloo1

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9:45 AM - FF05.03.06
Nanometal Interconnection Layers Deposited via Site-Specific Chemical Vapor Deposition for High Conductivity Copper-Carbon Nanotube Hybrids

Anthony Leggiero1,Dylan McIntyre1,Erin Loughran1,Shannon Driess1,Cory Cress2,Ivan Puchades1,Brian Landi1

Rochester Institute of Technology1,U.S. Naval Research Laboratory2

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10:00 AM -
BREAK


FF05.04: Area-Selective ALD/CVD
Session Chairs
David Munoz-Rojas
Greg Randall
Tuesday AM, December 03, 2019
Hynes, Level 3, Room 310

10:30 AM - FF05.04.01
Atomic Level Selective Surface Treatment by Down-Stream Plasma Generated Organic Radicals in Semiconductor Device Fabrication

Xinliang Lu1,Haochen Li1,Hua Chung1,Michael Yang1,Ting Xie1,Qi Zhang1,Shawming Ma1,Il-Kwon Oh2,Stacey Bent2

Mattson Technology Inc1,Stanford University2

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10:45 AM -
Open Discussion


11:00 AM - FF05.04.03
Area-Selective Atomic Layer Deposition of 2D WS2 Nanolayers

Ageeth Bol1,Shashank Balasubramanyam1,Mark Merkx1,Erwin Kessels1,Adrie Mackus1

Eindhoven University of Technology1

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11:15 AM - FF05.04.04
Area-Selective Deposition Using Atomic-Layer-Deposited Carbon, Fluorine-Free SiOx as an Inhibitor

Taewook Nam1,Inkyu Sohn1,Seunggi Seo1,Tatsuya Nakazawa1,Hyungjun Kim1

Yonsei University1

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11:30 AM - FF05.04.05
CVD Polymers on Heterogeneous Substrates for Energy Storage and Area-Selective Applications

Kenneth Lau1

Drexel University1

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FF05.05: Deposition of Organic and Hybrid Materials I
Session Chairs
Anna Maria Coclite
David Munoz-Rojas
Tuesday PM, December 03, 2019
Hynes, Level 3, Room 310

1:30 PM - FF05.05.01
iCVD and oCVD Thin-Film Multilayer Coatings for Board-Level and Wafer-Level Protection

Scott Morrison1,William O'Shaughnessy1

GVD Corporation1

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1:45 PM - FF05.05.02
Direct Transfer of Graphene on Paper Surface Using Hydrophobic Primer Layer Deposited by iCVD

Mehmet Gursoy1,Emre Citak1,Huseyin Sakalak2,Bilal Istanbullu2,Mustafa Karaman1

Konya Technical University1,Selcuk University2

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2:00 PM - FF05.05.03
Benchtop Evaporative iCVD Coater for Nanoglue Bonding

Greg Randall1

General Atomics1

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2:30 PM - FF05.05.04
Thermo-Responsiveness Linked to Deposition Conditions in Initiated Chemical Vapor Deposition of Smart Hydrogel Thin Films for Sensor Applications

Fabian Muralter1,Alberto Perrotta1,Oliver Werzer2,Anna Maria Coclite1

Graz University of Technology1,University of Graz2

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2:45 PM - FF05.05.05
The Wrinkling Concept Applied to Plasma Polymers—An Innovative Approach for the Fabrication of Flexible Electrodes

Damien Thiry1,Nathan Vinx1,Pascal Damman1,Pierre-Yves Tessier2,Rony Snyders1

University of Mons1,IMN2

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3:00 PM -
BREAK


3:30 PM - FF05.05.06
Controlling the Composition, Hardness and Function of Vapor-Phase Deposited Polymer Films

Sung Gap Im1

Korea Advanced Institute of Science and Technology (KAIST)1

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4:00 PM - FF05.05.07
Scalable, Single-Source, One-Step Synthesis of an Electrocatalyst

Sebastian Tigges1,Axel Lorke1,Nicolas Wöhrl1

University Duisburg-Essen and CENIDE1

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4:15 PM - FF05.05.08
Chemical Insolubility of Vapor Phase Infiltrated Poly(methyl methacrylate) / AlOx Hybrid Materials

Emily McGuinness1,Collen Leng1,Mark Losego1

Georgia Institute of Technology1

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4:30 PM - FF05.05.09
Novel Metal-Organic Structures and Engineered Inorganic-Organic Interfaces through ALD/MLD

Maarit Karppinen1

Aalto University1

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FF05.06: Poster Session: Advanced Atomic Layer Deposition and Chemical Vapor Deposition Techniques and Applications
Session Chairs
Graziella Malandrino
David Munoz-Rojas
Tuesday PM, December 03, 2019
Hynes, Level 1, Hall B

8:00 PM - FF05.06.01
Processing and Characterization of Hexagonal Boron Nitride Films of Wide-Area by Chemical Vapor Deposition on Silicon Substrates

Ranjan Singhal1,Raj Singh1

Oklahoma State University1

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8:00 PM - FF05.06.02
Microplasma-Driven, Area-Selective Atomic Layer Deposition of Aluminum Oxide at 300K

Jinhong Kim1,Andrey Mironov1,Sung-Jin Park1,J Eden1

University of Illinois Urbana Champaign1

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8:00 PM - FF05.06.03
Growth and Characterization of Corundum Structure Oxide Semiconductor on α-Fe2O3 Buffer Layers by The Mist CVD Method

Kazuki Shimazoe1,Hiroyuki Nishinaka1,Daisuke Tahara1,Yuta Arata1,Masahiro Yoshimoto1

Kyoto Institute of Technology1

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8:00 PM - FF05.06.04
Fabrication of Flexible and Epitaxial Oxide Thin Films on Cleaved Synthetic Mica Using Mist Chemical Vapor Deposition

Yuta Arata1,Hiroyuki Nishinaka1,Daisuke Tahara1,Kazuki Shimazoe1,Yusuke Ito1,Masahiro Yoshimoto1

Kyoto Institution of Technology1

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8:00 PM - FF05.06.05
Gaining Insight into Self-Limiting Surface Reactions During Plasma-Assisted Atomic Layer Deposition of III-Nitrides via In Situ Ellipsometry

Ali Okyay2,Deepa Shukla1,Adnan Mohammad1,Saidjafarzoda Ilhom1,Blaine Johs3,Brian Willis1,Necmi Biyikli1

University of Connecticut1,Stanford University2,Film Sense LLC3

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8:00 PM - FF05.06.06
Fabrication of Ferroelectric Hf0.5Zr0.5O2 Thin Film by Atomic Layer Deposition (ALD) Using H2O2 Precursor

Hyoungkyu Kim1,Seokjung Yun1,Hoon Kim1,Changdeuck Bae2,Seungbum Hong1

Korea Advanced Institute of Science and Technology1,Sungkyunkwan University2

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8:00 PM - FF05.06.07
Use of Refractory-Metal Diffusion Inhibitors in Catalytic Metal Particles for Catalytic CVD Growth of Ultra-Long Carbon Nanotubes (CNTs)

Michael Bronikowski1,Melissa King1

University of Tampa1

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8:00 PM - FF05.06.08
A Study of Initiated Chemical Vapor Deposition (iCVD) Siloxane Thin-Film Conformality at Different Length Scales

William Livernois1,Scott Morrison1,William O'Shaughnessy1

GVD Corporation1

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8:00 PM - FF05.06.09
Atomic Level Surface Functionalization of a Graphene Oxide Membrane to Break the Permeability-Selectivity Trade-Off in Salt Water Desalination

Jihoon Ahn1,Kyu-Jung Chae1

Korea Maritime & Ocean University1

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8:00 PM - FF05.06.10
Controlling the Optical and Electronic Properties of Polyaniline (Pani) Using Vapor Phase Infiltration of Titanium Tetrachloride

Shawn Gregory1,Yi Li1,Shannon Yee1,Mark Losego1

Georgia Institute of Technology1

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8:00 PM - FF05.06.11
Improving the Wet Strength of Nanopaper with Atomic Layer Deposited (ALD) Subnanometer Metal Oxide Coatings

Yi Li1,Mark Losego1,Rampi Ramprasad1,Lihua Chen1

Georgia Institute of Technology1

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8:00 PM - FF05.06.12
Understanding the Initial Growth During Atomic Layer Deposition of Nickel Sulfide via In Situ X-Ray Photoelectron Spectroscopy and Low Energy Ion Scattering

Yuanhong Gao1,Ran Zhao1,Xinwei Wang1

Peking University1

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8:00 PM - FF05.06.13
Epitaxial Growth and Band-Gap Control of Ni1-XMgXO Thin Film by Using Mist CVD Method

Takumi Ikenoue1,Masao Miyake1,Tetsuji Hirato1

Kyoto University1

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8:00 PM - FF05.06.14
Chemical Vapor Deposition Synthesis of a High-Quality MoS2 Layer by H2S/H2 Mixture—A Reactive Molecular Dynamics Study

Sungwook Hong1,2,Ken-ichi Nomura1,Rajiv Kalia1,Aiichiro Nakano1,Priya Vashishta1

University of Southern California1,California State University, Bakersfield2

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8:00 PM - FF05.06.15
oCVD Polymers and ALD Oxides Enhance Solar Technologies

Won Jun Jo1,Karen Gleason2,Heinz Frei1

Lawrence National Berkeley Laboratory1,Massachusetts Institute of Technology2

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8:00 PM - FF05.06.16
Fabrication and Characterization of Two-Phase Nanocomposites by Atomic Layer Deposition of Metal Oxides into Mesoporous Thi-Film Oxide Ceramics

Dominic Boll1,2,Erdogan Celik3,Matthias Elm3,Torsten Brezesinski1

Karlsruhe Institute of Technology1,Technische Universität Darmstadt2,Justus-Liebig-Universität Giessen3

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8:00 PM - FF05.06.18
Zinc Oxide Nanostructure Synthesis on Si(100) by Vapor Phase Transport and the Effect of Antimony Doping on pHotoelectric Properties, Morphology and Structure

Tarek Trad1,Parker Blount1,Zuleyma Romero1

Sam Houston State University1

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8:00 PM - FF05.06.19
Good Step Coverage of Iridium Metal Films by Spray CVD

Kazuhisa Kawano3,Yoshiyuki Seki1,Yutaka Sawada1,Hiroshi Funakubo2,Noriaki Oshima3

Tokyo Polytechnic University1,Tokyo Institute of Technology2,TOSOH Corporation3

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8:00 PM - FF05.06.20
Direct Growth of Single-Layer Terminated Vertical Graphene Nanosheets on Germanium Using Plasma Enhanced Chemical Vapor Deposition

ChunYu Lu1,Abdulrahman Al Hagri1

Khalifa University1

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8:00 PM - FF05.06.21
Growth Yield Variation of Single-Walled Carbon Nanotubes Inside a Horizontal Chemical Vapor Deposition System

Sung-Il Jo1,Goo-Hwan Jeong1

Kangwon National University1

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8:00 PM - FF05.06.22
Effect of Plasma Ignition on Growth Temperature Decrease of Single-Walled Carbon Nanotubes Using Plasma-Coupled CVD System

Sung-Il Jo1,Goo-Hwan Jeong1

Kangwon National University1

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8:00 PM - FF05.06.23
Synthesis of Bulk 2D Layered Silver Selenide (Ag2Se) Using Chemical Vapor Deposition as a Potential Candidate for Oxygen Reduction Reaction

Konar Rajashree1,Suparna Das1,Eti Teblum1,Gilbert Nessim1,Alex Schechter2

Bar Ilan University1,Ariel University2

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8:00 PM - FF05.06.24
Carbon Nanotubes Growth on TiSiN Barriers via Plasma Enhanced CVD—Analysis of the Physical and Chemical Processes and Modeling

Ahmed Andalouci1,Ivaylo Hinkov2,Salim Mourad Cherif1,Samir Farhat1

Université Paris 131,Département de Génie Chimique Université de Technologie Chimique et de Métallurgique2

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8:00 PM - FF05.06.25
Layer Control in Asymmetric CVD Graphene Growth

Haozhe Wang1,Wei Sun Leong1,Zhenpeng Yao2,GangSeob Jung1,Qichen Song1,Marek Hempel1,Tomas Palacios1,Gang Chen1,Markus Buehler1,Alan Aspuru-Guzik2,3,Jing Kong1

Massachusetts Institute of Technology1,Harvard University2,University of Toronto3

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8:00 PM - FF05.06.26
Comparative Study of the Effect of Thermal Processes and Rapid Thermal Annealing on the Photoluminescent Emission of Amorphous Silicon Carbide (a-SiC:H)

Maricela Meneses1,Mario Moreno1,Alfredo Morales1,Alfonso Torres1,Pedro Rosales1,Javier de la Hidalga1

National Institute of Astrophysics, Optics and Electronics1

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8:00 PM - FF05.06.27
The Effect of Different Ti Doping Ratios for ZnO Active Layer Thin-Film Transistors

Kelsea Yarbrough1,Sangram Pradhan1,Messaoud Bahoura1

Norfolk State University1

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8:00 PM - FF05.06.28
Thickness Gradient Film Formation by Spatial Atomic Layer Deposition for High-Throughput Screening of MIM Diodes

Abdullah Alshehri1,2,Khaled Ibrahim1,Kissan Mistry1,Jhi Loke1,Mustafa Yavuz1,Kevin Musselman1

University of Waterloo1,Prince Sattam Bin Abdulaziz University2

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8:00 PM - FF05.06.30
Vapor-Based Synthesis of Poly(ethylhexyl acrylate-co-acrylic acid) Thin Films as Pressure Sensitive Adhesives

Huseyin Sakalak1,Kurtuluş Yılmaz2,Mustafa Karaman2

Selcuk University1,Konya Technical University2

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8:00 PM - FF05.06.31
VACNT/Al2O3 Nanocomposite Fabrication via Novel Water-Assisted Chemical Vapor Deposition Followed by Atomic Layer Deposition

Lev Rovinsky1,Barun Barick2,Tamar Segal2,Noa Lachman1

Tel Aviv University1,Technion–Israel Institute of Technology2

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8:00 PM - FF05.06.32
A CsVO3/Quasi-2D Oxide Heterostructure by Chemical Vapor Deposition

Saloni Pendse1,Jian Shi1

Rensselaer Polytechnic Institute1

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8:00 PM - FF05.06.33
Role of Gold and Dielectric Spacer in the Manufacture of Electroluminescent Devices Based in Silicon Quantum Dots

Arturo Rodríguez-Gómez1

Instituto de Física - Universidad Nacional Autónoma de México1

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8:00 PM - FF05.06.34
Influence of Active Nitrogen Species on InN Growth and Structural Properties in Migration-Enhanced Remote Plasma MOCVD

Zaheer Ahmad1,Mark Vernon1,Garnett Cross1,Alexander Kozhanov1

Georgia State University1

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8:00 PM - FF05.06.35
Plasma-Enhanced Atomic Layer Deposition of Vanadium Dioxide (VO2) Using TEMAV and Oxygen Plasma

Adnan Mohammad1,Saidjafarzoda Ilhom1,Deepa Shukla1,Necmi Biyikli1

University of Connecticut1

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8:00 PM - FF05.06.36
Real-Time In Situ Monitoring Atomic Layer Doping Processes for Group-III Doped ZnO Layers—Super-Cycle Versus Co-Dosing Approach

Adnan Mohammad1,Saidjafarzoda Ilhom1,Deepa Shukla1,Md Tashfiq Bin Kashem1,ABM Hasan Talukder1,Helena Silva1,Ali Gokirmak1,Brian Willis1,Necmi Biyikli1

University of Connecticut1

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8:00 PM - FF05.06.37
Large-Area, Uniform Growth of Nanoporous Biocompatible Polymer by Pressure- and Flux-Controlled Vapor Deposition

Joonhee Lee1,Katelyn Ramsey1,H M Azazul Karim1

West Virginia University1

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8:00 PM - FF05.06.38
Control of Micro-Ring Generation of Fullerene Thin Films Using Mixed Solvent in Mist Vapor Deposition Method

Shigetaka Katori1,Risako Taguchi1

National Institute of Technology, Tsuyama College1

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8:00 PM - FF05.06.39
Atomic Layer Deposition of Titanium Sulfide Thin Films and Its Oxidation in Ambient

Hochul Nam1,Changdeuck Bae1,Hyunjung Shin1

Sungkyunkwan University1

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8:00 PM - FF05.06.40
Conformal Coating of Freestanding Particles by Vapor-Phase Infiltration

Andreas Liapis1,Ashwanth Subramanian2,Kim Kisslinger3,Chang-Yong Nam3,2,Seok-Hyun Yun1

Harvard Medical School & Massachusetts General Hospital1,Stony Brook University, The State University of New York2,Brookhaven National Laboratory3

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8:00 PM - FF05.06.41
Electro-Optical Characteristics of Low-Temperature Plasma-Assisted ALD-Grown InN Films as Active Layers in Visible/Near-IR Photodetectors

Saidjafarzoda Ilhom1,Adnan Mohammad1,Deepa Shukla1,2,Brian Willis3,Necmi Biyikli1

The University of Connecticut1,University of Connecticut 2,University of Connecticut3

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8:00 PM - FF05.06.42
Growth Behavior and Electrical Properties of Atomic Layer Deposited SrTiO3 on Ge Substrate

Dong Gun Kim1

Seoul National University1

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8:00 PM - FF05.06.43
Characteristics of 2D SnS2 as a Channel Layer in TFT Device

Hyeongtag Jeon1,Hyeongsu Choi1,Hyunwoo Park1,Namgue Lee1

Hanyang University1

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8:00 PM - FF05.06.44
Multiphysics Modeling of Atmospheric Plasma Deposition of Zirconia

Arash Tourki Samaei1,Santanu Chaudhuri1

University of Illinois Chicago1

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8:00 PM - FF05.06.45
Improvement of Reverse Leakage Current Characteristics of Si-Based Homoepitaxial InGaN/GaN Light Emitter for MEMS Applications

Keun Song1,Moonsang Lee2,Hyun Uk Lee2,Jaekyu Kim3

Korea Advanced Nano Fab Center1,Korea Basic Science Institute2,Hanyang University3

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2019-12-04   Show All Abstracts

Symposium Organizers

Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS

Symposium Support

Gold
GVD Corporation
Lam Research Corp

Silver
Specialty Coating Systems

Bronze
Waterloo Institute for Nanotechnology
FF05.07: Deposition of Organic and Hybrid Materials II
Session Chairs
Steven George
Kevin Musselman
Wednesday AM, December 04, 2019
Hynes, Level 3, Room 310

8:00 AM - FF05.07.01
Initiated Chemical Vapor Deposition onto Liquid Substrates

Malancha Gupta1,Mark De Luna1,Prathamesh Karadikar1

University of Southern California1

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8:30 AM - FF05.07.02
Oxidative Molecular Layer Deposition of Highly Conductive PEDOT Using a Volatile Liquid Oxidant

Amanda Volk1,Jung-Sik Kim1,Gregory Parsons1

North Carolina State University1

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8:45 AM - FF05.07.03
Device Integration of Ultrathin oCVD PEDOT Films in Perovskite Solar Cell

Meysam Gharahcheshmeh1,Mohammad Mahdi Tavakoli1,Edward Gleason1,Maxwell Robinson1,Jing Kong1,Karen Gleason1

Massachusetts Institute of Technology (MIT)1

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9:00 AM - FF05.07.04
Development of Devices Based on Stimuli-Responsive Thin Films Deposited by iCVD

Anna Maria Coclite1

Graz University of Technology1

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9:30 AM - FF05.07.05
Functional Polymer Thin Films with Tailored Properties by Initiated Chemical Vapor Deposition

Wiebke Reichstein1,Stefan Schröder1,Maximilian Burk1,Adrivit Mukherjee1,Cenk Aktas1,Thomas Strunskus1,Franz Faupel1

University of Kiel1

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9:45 AM -
BREAK


FF05.08: Deposition of 2D Materials, Sulphides and Nitrides I
Session Chairs
Elisabeth Blanquet
Steven George
Wednesday AM, December 04, 2019
Hynes, Level 3, Room 310

10:15 AM - FF05.08.01
Molybdenum Disulfides and Diselenides by Atomic Layer Deposition

Jan Macak1,2,Raul Zazpe1,2,Jaroslav Charvot1,Richard Krumpolec3,Milos Krbal1,Jan Prikryl1,Filip Bures1

University of Pardubice1,Brno University of Technology2,Masaryk University3

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10:30 AM - FF05.08.02
Patterned Growth of Graphene and Hexagonal Boron Nitride Heterostructures Using a “Gettering” CVD Approach

Irfan Haider Abidi1,2,Barbaros Oezyilmaz1,Zhengtang Luo2

National University of Singapore1,The Hong Kong University of Science and Technology2

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10:45 AM - FF05.08.03
Wafer Scale MOCVD Grown BN for Encapsulation of 2D Devices

Michael Snure1,Shivashankar Vangala1,Gene Siegel2

Air Force Research Laboratory1,KBR2

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11:00 AM - FF05.08.04
Catalyst Engineering for Scalable 2D Film Control—The Dark Secrets of Bulk Oxygen and Integrated Pathways for Single-Crystal Growth

Oliver Burton1,Vitaly Babenko1,Vlad-Petru Veigang-Radulescu1,2,Barry Brennan2,Andrew Pollard2,Stephan Hofmann1

University of Cambridge1,National Physics Laboratory2

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11:15 AM - FF05.08.05
CVD Strategy for Transition Metal Dichalcogenides Monolayers

Wei Sun Leong1

Massachusetts Institute of Technology (MIT)1

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11:30 AM - FF05.08.06
Formation of Micrometer Sized, Hierarchical h-BN Superstructures from Combined PECVD and MOCVD Processes

Anja Sutorius1,Daniel Stadler1,Robert Frohnhoven1,Yakup Gönüllü1,Yogendra Mishra2,Sanjay Mathur1

University of Cologne1,University of Kiel2

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FF05.09: Deposition of 2D Materials, Sulphides and Nitrides II
Session Chairs
Malancha Gupta
David Munoz-Rojas
Wednesday PM, December 04, 2019
Hynes, Level 3, Room 310

1:30 PM - FF05.09.01
Revisited Thermal and Plasma Enhanced Atomic Layer Deposition Processes of Metal Nitrides—Challenges and Opportunities

Elisabeth Blanquet1,Arnaud Mantoux1,Frederic Mercier1,Raphael Boichot1,Michel Pons1,Carmen Jimenez1

University Grenoble Alpes1

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2:00 PM - FF05.09.02
Relationship between the Gas-Phase Reactions Occurring within an Electron Cyclotron Resonance- (ECR) Microwave- (MW) CVD Process and the Properties of Hydrocarbon Films

Jesús García Figueroa1,David Harding1

Laboratory for Laser Energetics and Department of Chemical Engineering1

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2:15 PM - FF05.09.03
Novel Approach for Conformal Chemical Vapour Phase Deposition of Ultra-Thin Conductive Silver Films

Sabrina Wack1,Renaud Leturcq1,Petru Lunca-Popa1,Noureddine Adjeroud1

LIST1

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2:30 PM -
BREAK


3:30 PM - FF05.09.04
Low-Temperature Self-Limiting Growth of β-Ga2O3 Films on Flexible Substrates via Plasma-Enhanced ALD

Saidjafarzoda Ilhom1,Adnan Mohammad1,Deepa Shukla1,2,Brian Willis2,Necmi Biyikli1

The University of Connecticut1,University of Connecticut2

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3:45 PM - FF05.09.05
Synthesis of Hexagonal Boron Nitride Using Microplasma

Vianney Mille1,Hiba Kabbara1,Alexandre Tallaire2,Salima Kasri1,Ovidiu Brinza1,Claudia Lazzaroni1,Guillaume Lombardi1

LSPM CNRS UPR34071,Institut de Recherche de Chimie Paris - IRCP UMR 82472

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4:00 PM - FF05.09.06
Electron Enhanced Atomic Layer Deposition (EE-ALD)

Steven George1

University of Colorado1

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4:30 PM - FF05.09.07
Low-Temperature Synthesis and Characterization of Crystalline GaN Thin Films for Flexible/Wearable Electronic Devices Using Plasma-Assisted Atomic Layer Deposition

Deepa Shukla1,Saidjafarzoda Ilhom1,Adnan Mohammad1,Blaine Johs2,Necmi Biyikli1

University of Connecticut1,Film Sense LLC2

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4:45 PM - FF05.09.08
Magnetic Field-Assisted Chemical Vapor Deposition—New Pathways for Functional Materials

Daniel Stadler1,Vanessa Rauch1,David Mueller2,Peter Tutacz1,Thomas Brede3,Michael Frank1,Tomas Duchon2,Thomas Fischer1,Margret Giesen2,Claus Schneider2,Cynthia Volkert3,Sanjay Mathur1

University of Cologne1,Research Center Jülich2,Georg-August-University3

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2019-12-05   Show All Abstracts

Symposium Organizers

Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS

Symposium Support

Gold
GVD Corporation
Lam Research Corp

Silver
Specialty Coating Systems

Bronze
Waterloo Institute for Nanotechnology
FF05.10/EN11.10: Joint Session: ALD/CVD for Photovoltaics
Session Chairs
Takuya Matsui
Kevin Musselman
Thursday AM, December 05, 2019
Hynes, Level 3, Room 310

9:00 AM - FF05.10.01/EN11.10.01
Atomic Layer Deposited Nanolayers for Silicon Photovoltaics

Erwin Kessels1,Bart Macco1,Jimmy Melskens1

Eindhoven University of Technology1

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9:30 AM - FF05.10.02/EN11.10.02
Thermally Stable Passivating Hole-Selective Contacts Using Atomic Layer Deposited Molybdenum Oxide with Thin Aluminum Oxide

Geoffrey Gregory1,Zhengning Gao1,Titel Jurca1,Parag Banerjee1,Kristopher Davis1

University of Central Florida1

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9:45 AM - FF05.10.03/EN11.10.03
TiOx Thin Layer as an Efficient Passivating Hole Selective Contact

Takuya Matsui1,Martin Bivour2,Martin Hermle2,Hitoshi Sai1

National Institute of Advanced Industrial Science and Technology (AIST)1,Fraunhofer Institut für Solare Energiesysteme ISE2

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10:00 AM -
BREAK


10:30 AM - FF05.10.04/EN11.10.04
Hf Doped ZnO Engineering for Various Solar Cells Architectures

Boulos Alfakes1,Juan Villegas2,ChunYu Lu1,Ibraheem Almansouri1,Matteo Chiesa1,3

Khalifa University of Science and Technology1,New York University2,UiT The Arctic University of Norway3

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10:45 AM - FF05.10.05/EN11.10.05
Fabrication of Sb2S3 Planar Thin-Film Solar Cell with Vapor Transport Deposition (VTD) Method

Yiyu Zeng1,Kaiwen Sun1,Jialiang Huang1,Micheal Nielsen1,Martin Green1,Xiaojing Hao1

University of New South Wales1

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11:00 AM - FF05.10.06/EN11.10.06
Atomic-Layer-Deposited ZnO as a Full-Area Passivating, Contacting and Antireflection Layer for c-Si Solar Cells

Bart Macco1,Marc Dielen1,Bas van de Loo1,Jimmy Melskens1,Erwin Kessels1

Eindhoven University of Technology1

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11:15 AM - FF05.10.07/EN11.10.07
Controllable Fixed Charge Densities of TiO2–Based Passivation Layer in c-Si Solar Cells

Dohee Kim1,Jihun Oh1

Korea Advanced Institute of Science and Technology1

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11:30 AM - FF05.10.08/EN11.10.08
Opening up the Processing Window for Chemical Vapor Deposited Oxides over Lead-Halide Perovskite Photovoltaics to Achieve Improved Performance

Robert Hoye1,Ravi Raninga1,Robert Jagt1,Solene Bechu2,3,Tahmida Huq1,Yen-Hung Lin4,Zewei Li1,Muriel Bouttemy2,3,Mathieu Fregnaux2,3,Henry Snaith4,Richard Friend4,Philip Schulz2,5,Judith MacManus-Driscoll1

University of Cambridge1,Institut Photovoltaïc d’Île de France (IPVF)2,Université de Versailles Saint-Quentin en Yvelines, Université Paris-Saclay CNRS3,University of Oxford4,CNRS, Institut Photovoltaïc d’Île de France (IPVF)5

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FF05.11: Devices and Applications Enabled by ALD/CVD I
Session Chairs
Mato Knez
David Munoz-Rojas
Thursday PM, December 05, 2019
Hynes, Level 3, Room 310

1:30 PM - FF05.11.01
Enabling High Capacity Lithium Battery Anodes Using Thin-Film Deposition Technology

Wyatt Tenhaeff1

University of Rochester1

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2:00 PM - FF05.11.02
Atomic Layer Deposition of Alumina on CVD Silicon Nanostructures—Towards the Development of 3D Ultrastable Aqueous Si Microsupercapacitor

Pascal Gentile1,Anthony Valero1,Dorian Gaboriau1,Adrien Mery1,Said Sadki2,1

CEA Grenoble1,Université Grenoble Alpes2

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2:15 PM - FF05.11.03
Atomic Layer Deposition of Hf-Doped ZnO Thin Films with Enhanced Thermoelectric Properties

Jenichi Clairvaux Felizco1,Taneli Juntunen2,Jarkko Etula2,Camilla Tossi2,Mutsunori Uenuma1,Yasuaki Ishikawa1,Yukiharu Uraoka1,Ilkka Tittonen2

Nara Institute of Science and Technology1,Aalto University2

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2:30 PM - FF05.11.04
ALD Process Control towards Fabrication of Reliable Nano-Sized Memristive Devices

Susanne Hoffmann-Eifert1,Hehe Zhang1,Alexander Hardtdegen1,Felix Cüppers1,Stephan Aussen1

Forschungszentrum Jülich GmbH1

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2:45 PM - FF05.11.05
Sequential Infiltration Synthesis of Nano-Porous Alumina for Resistive Switching Memory with Ultra-High On/Off Ratio and Low Voltage Operation

Abhinav Prakash1,Bhaswar Chakrabarti1,2,3,Khan Alam1,4,3,Thomas Gage3,Leonidas Ocola3,Ralu Divan3,Daniel Rosenmann3,Abhishek Khanna5,Benjamin Grisafe5,Toby Sanders6,Suman Datta5,Ilke Arsalan3,Supratik Guha1,3

The University of Chicago1,Indian Institute of Technology Madras2,Argonne National Laboratory3,King Fahd University of Petroleum and Minerals4,University of Notre Dame5,Arizona State University6

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3:00 PM -
BREAK


3:30 PM - FF05.11.06
Atomic Layer Deposition of Metals and Oxides onto Structured Si to Fabricate Efficient Photoanodes

Lionel Santinacci1,Maxime Dufond1,Maimouna Diouf1,Gabriel Loget2,Chiara Cozzi3,Giuseppe Barillaro3,Jean-Manuel Decams4,Sandra Haschke5,Julien Bachmann5,6

CNRS, Aix-Marseille Univ.1,CNRS, Univ. Rennes 12,University of Pisa3,Annealsys SAS4,University of Erlangen-Nuremberg5,Saint Petersburg State University6

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3:45 PM - FF05.11.07
Planar and Three-Dimensional Hybrid-LEDs Based on Inorganic GaN and Organic PEDOT Fabricated by Oxidative Chemical Vapor Deposition (oCVD)

Florian Meierhofer1,Sascha Gorny1,Linus Krieg1,Joergen Jungclaus1,Tobias Voss1

Braunschweig University of Technology1

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4:00 PM - FF05.11.08
Vapor Phase Infiltration of Metal Oxides into Microporous Polymer Membranes for Organic Solvent Separation

Mark Losego1,Emily McGuinness1,Fengyi Zhang1,Ryan Lively1

Georgia Institute of Technology1

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4:15 PM - FF05.11.09
Vapor-Phase Inorganic Infiltration into Hierarchically Self-Assembled Block Copolymer Thin Films Generates Three-Dimensional Electroactive ZnO Nanomesh

Chang-Yong Nam2,1,Ashwanth Subramanian1,Gregory Doerk2,Kim Kisslinger2,Daniel Yi1,Robert Grubbs1

Stony Brook University1,Brookhaven National Laboratory2

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4:30 PM - FF05.11.10
Atomic Layer Processing—A Toolbox for Fabricating Novel Functional Hybrid Materials

Mato Knez1,2

CIC nanoGUNE1,IKERBASQUE2

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2019-12-06   Show All Abstracts

Symposium Organizers

Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS

Symposium Support

Gold
GVD Corporation
Lam Research Corp

Silver
Specialty Coating Systems

Bronze
Waterloo Institute for Nanotechnology
FF05.12: Devices and Applications Enabled by ALD/CVD II
Session Chairs
Karen Gleason
Sven Van Elshocht
Friday AM, December 06, 2019
Hynes, Level 3, Room 310

8:30 AM - FF05.12.01
On the Origin of the High Conductivity of Intrinsic ALD-ZnO

Daniel Hiller1,Dirk König2

The Australian National University1,University of New South Wales2

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8:45 AM - FF05.12.02
Molecular Layer Deposition of Metal-Organic Thin Films with Resistive Switching Properties for Neuromorphic Computing

Mikko Nisula1,Christophe Detavernier1

Ghent University1

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9:00 AM - FF05.12.03
PbI2 Deposition from Solution-Atomic Layer Deposition for Photovoltaic Application

Maïssa Barr1,Ceyla Asker1,Soheila Nadiri1,Karen Forberich2,Felix Hoga3,Tobias Stubhan3,Hans Egelhaaf3,Christoph Brabec2,Julien Bachmann1

FAU-CTFM1,i-MEET2,ZAE Bayern - Erneuerbare Energien3

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9:15 AM - FF05.12.04
Lithium-Containing Thin Films by Atomic Layer Processing

John Hennessy1

Jet Propulsion Laboratory1

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9:30 AM - FF05.12.05
Atomic Layer Deposition as a Tool to Produce Photonic Materials for High-Temperature Applications

Kaline Furlan1,2,Robert Zierold2,Alexander Petrov3,Robert Blick2,Manfred Eich3,Gerold Schneider1,Rolf Janssen1

TUHH1,University of Hamburg2,Technische Universität Hamburg-Harburg3

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9:45 AM - FF05.12.06
ZnO Nanotube-Based Gas Sensors and Metal-Chalcogenide Memristors by Atomic Layer Deposition with an Oxygen Plasma and Annealing Processes

Seonghoon Lee1,Sungkwon Cho1,Kyungsub Lee1

Seoul National University1

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10:00 AM -
BREAK


10:30 AM -
Open Discussion


10:45 AM - FF05.12.08
Novel Material and Process Options for Future Technology Nodes in Semiconductor Industry

Sven Van Elshocht1

imec1

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11:15 AM - FF05.12.09
Oxidative Chemical Vapor Deposition Enabled Poly(3-methylthiophene) Coating on Horizontally Aligned Carbon Nanotubes for Flexible Supercapacitors with Ultrahigh Areal Capacitance

Yue Zhou1,2

Massachusetts Institute of Technology1,South Dakota State University2

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11:30 AM - FF05.12.10
How Atomic Layer-Deposited Oxides Can Push Artificial Photosynthesis towards Terawatt Scale

Won Jun Jo1,Georgios Katsoukis1,Heinz Frei1

Lawrence Berkeley National Laboratory1

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11:45 AM - FF05.12.11
Characterizing the Robustness of β-SiC Coatings for Applications in Magnetic Fusion Energy

Tyler Abrams1,Stefan Bringuier1,Sean Gonderman1,Dmitry Rudakov2,Gregory Sinclair3,Ezekial Unterberg4,Robert Wilcox4,Leo Holland1

General Atomics1,University of California, San Diego2,Oak Ridge Associated Universities3,Oak Ridge National Laboratory4

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Symposium Support