IIT 2021 School
September 9-11, 2021
IIT 2021 will be preceded by a three-day school on ion implantation and annealing with a faculty of international experts and a 600+ page textbook written for this course. School details, including schedule, abstracts and speaker information, will be available in June.
IIT 2021 Conference
September 12-16, 2021
The five-day Conference will feature oral and poster presentations covering the following topics:
Advanced Implant/Doping and Annealing Equipment
Annealing Technologies and Processes
- Rapid Thermal Processing, Laser Annealing, Flash Annealing, SPE, New Activation Annealing
- Junction, Silicide, Contact and Dielectric Formation
- Lattice Damage and Defects
Device Applications for Implant/Doping and Annealing Processes
- CMOS Devices, Memory Devices, Power Devices (SiC, GaN), RF-SOI, Image Sensors, IoT Devices, Photovoltaics, III-V Devices
- Integration with Other Fabrication Processes
Implant/Doping Technologies and Processes
- Ion Implantation, Plasma Doping, Gas and Solid Doping
- Junction Formation, MeV Implant, Materials Modification
Metrologies for Implant/Doping and Annealing Processes
- Physical and Electrical Characterization of 2D and 3D Structures
- Advanced Process Control
Modeling and Simulation of Implant/Doping and Annealing Processes