2025 MRS Fall Meeting & Exhibit
Symposium EL05-Frontiers in Low-Dimensional Complex Oxide Materials
Complex oxides host a wide array of emergent phenomena spanning electronic, magnetic, and electrochemical properties. Recent advancements in materials development, particularly within epitaxial thin films and interfaces, have catalyzed novel implications in microelectronics and energy devices. This symposium covers recent advances in the science of complex oxide thin films, heterostructure interfaces, and freestanding membranes. Topics of interest include, but are not limited to, new materials discovery driven by computational and synthesis sciences, advanced characterization of structures and properties, quantum phenomena in oxide materials, ionic and electronic charge transfer across interfaces, and device applications. Research on novel strain engineering, topological defect structures, and new interfacial phenomena is particularly encouraged. This symposium aims to bring together scientific experts and young scientists with an interest in oxides, fostering interactions and advancing knowledge of emergent functional properties based on low-dimensional oxide materials.
Topics will include:
- Advanced synthesis of complex oxide thin films, heterostructures, nanostructures, and membranes
- Advanced characterization of complex oxides by microscopy and spectroscopy
- Theoretical simulation and modeling of oxide heterostructures
- Emergent phenomena in epitaxial and non-epitaxial (twisted) oxide interfaces
- Strain-engineering of oxide thin films and membranes
- Ferroelectric and multiferroic oxide materials and devices
- Unconventional superconductivity in oxides
- Oxide materials and devices for neuromorphic computing
- Solid-state ionics in oxide materials
- Oxide thin films and interfaces for batteries and electrocatalysis
Invited Speakers:
- Charles Ahn (Yale University, USA)
- Marco Bernardi (California Institute of Technology, USA)
- Celesta Chang (Seoul National University, Republic of Korea)
- Sung-Yoon Chung (Korea Advanced Institute of Science and Technology, Republic of Korea)
- Regina Dittmann (RWTH Aachen University, Germany)
- Yingge Du (Pacific Northwest National Laboratory, USA)
- Chang-Beom Eom (University of Wisconsin-Madison, USA)
- Marta Gibert (Technische Universität Wien, Austria)
- Berit Goodge (Cornell University, USA)
- John Heron (University of Michigan, USA)
- Megan Holtz (Colorado School of Mines, USA)
- Dennis Huang (Max-Planck Institute for Solid State Research, Germany)
- Harold Hwang (Stanford University, USA)
- James LeBeau (Massachusetts Institute of Technology, USA)
- Shi Liu (Westlake University, China)
- Lane Martin (Rice University, USA)
- Julia Mundy (Harvard University, USA)
- Rossitza Pentcheva (Universität Duisburg-Essen, Germany)
- Nicola Perry (University of Illinois at Urbana-Champaign, USA)
- Nini Pryds (Technical University of Denmark, Denmark)
- Ramamoorthy Ramesh (University of California, Berkeley, USA)
- Darrell Schlom (Cornell University, USA)
- Bilge Yildiz (Massachusetts Institute of Technology, USA)
- Hiroko Yokota (Tokyo Institute of Technology, Japan)
- Jinxing Zhang (Beijing Normal University, China)
Symposium Organizers
Seung Sae Hong
University of California, Davis
Department of Materials Science and Engineering
USA
Christoph Baeumer
University of Twente
Department of Inorganic Materials Science
Netherlands
Lucas Caretta
Brown University
School of Engineering
USA
Ruijuan Xu
North Carolina State University
Department of Materials Science and Engineering
USA
Topics
electronic material
epitaxy
interface
oxide
thin film