Jiwoong Yang1,Moon Kee Choi2
Daegu Gyeongbuk Institute of Science & Technology (DGIST)1,Ulsan National Institute of Science and Technology (UNIST)2
Jiwoong Yang1,Moon Kee Choi2
Daegu Gyeongbuk Institute of Science & Technology (DGIST)1,Ulsan National Institute of Science and Technology (UNIST)2
High-resolution patterning techniques that can produce red/green/blue pixels are essential for next-generation advanced displays. Photolithography and inkjet printing have traditionally been applied to create patterns of light-emitting nanocrystals such as CdSe, InP, and perovskite based nanocrystals. However, these methods usually degrade the optical and electrical properties of those nanocrystals because of the severe processing conditions (associated to the use of various chemicals and ultraviolet radiation) and the presence of organic residues (photoresists and additives for photolithography and inkjet printing, respectively).<br/>Here, we present the ultrahigh-resolution transfer printing techniques for next-generation advanced displays. This method does not use wet chemicals and does not remain organics in the created patterns, suggesting its potential to exploit unique properties of light-emitting nanocrystals. The method can produce ultrahigh-resolution colloidal quantum dot patterns.<sup>[1-5]</sup> Furthermore, the interfacial engineering between the stamps and nanocrystals broadens its applicability to a variety of materials, including perovskite nanocrystals.<sup>[6]</sup> We can successfully fabricate ultrahigh-resolution perovskite patterns, and the external quantum efficiencies of the printed perovskite light-emitting didoes are greater than those of previously reported printed perovskite light-emitting didoes. Our results highlight that the transfer printing is promising for ultrahigh-resolution display applications.<br/><br/>[1] M.K. Choi <i>et al. </i>Nature Commun. 6, 7149 (2015).<br/>[2] J. Yang <i>et al. </i>Adv. Mater. 28, 1176 (2016).<br/>[3] M.K. Choi <i>et al. </i>npj Flex Electron 2, 10 (2018).<br/>[4] J. Yang <i>et al. Nano Lett.</i> 21, 26 (2021).<br/>[5] …, D.-H. Kim*, J. Yang*, M.K. Choi* <i>et al. Nanoscale Horiz. </i>7, 801 (2022).<br/>[6] Unpublished.