Tracking the Surface Chemistry and Composition of Complex Oxides In Situ During Growth

Thin films of complex oxides have demonstrated emergent properties spanning electronics to superconductivity. The advances in growth techniques such as molecular beam epitaxy, and pulsed laser deposition to <i>in situ </i>characterization techniques such as reflection high energy electron diffraction (RHEED) have underpinned these discoveries. Unlike <i>in situ </i>structural characterization, chemical and compositional analysis of thin films during growth remains scarce. My group has developed an Auger electron spectroscopy method to probe that can be used concurrently with RHEED to monitor structure and composition of oxide surfaces during thin film growth. We have used these techniques to establish stoichiometric growth of complex oxides with<i> in situ </i>control and first, direct observation of surface termination switching in complex oxides during the growth. I will also discuss opportunities for real time control of growth and other advances in understanding and controlling surface chemistry in oxide thin films during growth.