2021 MRS Spring Meeting

Call for Papers

Symposium CT03-Imaging Materials with X-Rays—Recent Advances with Synchrotron and Laboratory Sources

The last decade has seen a tremendous evolution of x-ray imaging and microscopy. This has been driven by the rapid development of third and fourth generation x-ray facilities, as well as new laboratory sources and x-ray optics capable of producing beams routinely below 50 nm in size. The high penetrating power, extreme sensitivity of x-rays to strain and defects and the tunability of these new sources to access x-ray fluorescence of much of the periodic table has enabled in situ or operando studies of nano-scale properties materials. It is worth also emphasizing that small x-ray beams may also be used to induce an electrical current or light emission in the nano-object enabling enhanced scanning probe and photo excitation studies.Beyond a discussion of the methods which have been developed, and are still an object of active research (coherent diffraction imaging in forward or Bragg or full field imaging conditions, nano x-ray fluorescence imaging, micro-Laue diffraction …), this symposium aims to review the materials science issues that these new tools can help solving. The range of materials science topics and related applications is indeed very large: electronic and optoelectronic devices (including flexible devices), transport properties, photovoltaic applications, catalysis, energy harvesting and storage, and even structural materials.

In all these areas, being able to investigate local structure-function relationships at the nano-scale during operation is a fundamental issue. The techniques described above have begun to make a major impact on these fundamental materials science questions. Our invited speakers, as well as the growing community of x-ray facility users, will present a complete overview of the capabilities and science being engaged with x-ray imaging and microscopy. These capabilities are only going to grow with the new, high brightness, synchrotrons and tabletop facilities appearing and being planned worldwide.


Topics will include:

  • X-Ray Imaging and Microscopy developments
  • Coherent x-ray diffraction imaging
  • Laue diffraction microscopy
  • X-Ray fluorescence microscopy
  • Full field diffraction x-ray microscopy
  • Nano x-ray computed tomography
  • Materials science utilizing the methods:
  • Strain mapping and engineering
  • Nanostructures (metals, oxides, semiconductors)
  • In Situ or Operando studies
  • Mechanical and transport properties
  • Optoelectronic properties
  • Bioinspired materials and biomimetics

Invited Speakers:

  • Emma Cating-Subramanian (University of Colorado Boulder, USA)
  • Yong Chu (Brookhaven National Laboratory, USA)
  • Thomas Cornelius (Institut Matériaux Microélectronique Nanosciences de Provence, France)
  • Ross Harder (Argonne National Laboratory, USA)
  • Jorge Nicolas Hernandez-Charpak (STROBE University of Colorado, USA)
  • Hyunjung Kim (Sogang University, Republic of Korea)
  • Kristina Kutukova (Fraunhofer Institute for Ceramic Technologies and Systems, Germany)
  • Camille La Fontaine (Synchrotron SOLEIL, France)
  • Christian Lavoie (IBM T.J. Watson Research Center, USA)
  • John Miao (University of California, Los Angeles, USA)
  • Hande Ozturk (Ozyegin University, Turkey)
  • Marie-Ingrid Richard (European Synchrotron Radiation Facility, France)
  • Beatrice Ruta (Université de Lyon, France)
  • Gerd Schneider (Helmholtz-Zentrum Berlin, Germany)
  • Tobias Schulli (European Synchrotron Radiation Facility, France)
  • Nobumichi Tamura (Lawrence Berkeley National Laboratory, USA)
  • Wenbing Yun (Sigray, Inc., USA)
  • Izabela Zglobicka (Warsaw University of Technology, Poland)
  • Tao Zhou (Argonne National Laboratory, USA)

Symposium Organizers

Olivier Thomas
Aix Marseille Université
CNRS IM2NP
France
33-491288672, olivier.thomas@im2np.fr

Arief Budiman
Surya University
Center for Solar Photovoltaics (CPV)
Indonesia

Margaret Murnane
University of Colorado Boulder
STROBE Science and Technology Center
USA

Ehrenfried Zschech
Fraunhofer IKTS
Germany