S16 Landing Banner 1400x275

Symposium NT7 : Nanoparticle Characterization and Removal

2016-03-29   Show All Abstracts

Symposium Organizers

Manish Keswani, University of Arizona
Paul Mertens, IMEC
Kash Mittal, Reviews of Adhesion and Adhesives
Jin-Goo Park, Hanyang University

Symposium Support

Micron Foundation
PCT Systems, Inc.
Semiconductor Research Corporation
Tokyo Electron
NT7.1: Nanoparticle Adhesion and Characterization
Session Chairs
Jeffery Butterbaugh
Kash Mittal
Tuesday PM, March 29, 2016
PCC North, 100 Level, Room 128 A

1:30 PM - *NT7.1.01
Effect of Relative Humidity on Nanoparticle Adhesion

Stephen Beaudoin 1,Aaron Harrison 1,David Corti 1

1 Purdue University West Lafayette United States,

Show Abstract

2:00 PM - NT7.1.02
Moving Au Nanoparticles Using a Focused Electron Probe

Nan Jiang 1

1 Arizona State Univ Tempe United States,

Show Abstract

2:15 PM - *NT7.1.03
Adhesion Characterization of Single Microparticles

Cetin Cetinkaya 1

1 Clarkson Univ Potsdam United States,

Show Abstract

2:45 PM - NT7.1.04
An NMR Toolbox for Characterizing Nanomaterials

Chengchen Guo 2,Jeffery Yarger 2,Brian Cherry 2,Gregory Holland 3,Samrat Amin 2

1 School of Molecular Sciences Arizona State Univ Tempe United States,2 Magnetic Resonance Research Center Arizona State University Tempe United States,3 Department of Chemistry and Biochemistry San Diego State University San Diego United States

Show Abstract

3:00 PM -
BREAK

3:30 PM - *NT7.1.05
RapidNano; Towards 20nm Particle Detection on EUV Mask Blanks

Jacques van der Donck 1,Peter Bussink 1,Erik Fritz 1,Peter van der Walle 1

1 TNO Delft Netherlands,

Show Abstract

4:00 PM - NT7.1.06
Carbon Nanotubes Doped with Metal Oxide Nanoparticles as New Materials for Oil Removal

Ahmad Kayvani Fard 2,Marwan Khariesheh 1,Nidal Hilal 1,Muataz Hussien 2

1 Qatar Environmental and Energy Research Institute Doha Qatar,2 College of Science and Engineering Hamad Bin Khalifa University Doha Qatar,1 Qatar Environmental and Energy Research Institute Doha Qatar

Show Abstract

4:15 PM - *NT7.1.07
Wet Process Challenges for Advance Node IC Manufacturing

Stefan Degendt 2,Sophia Arnauts 1,Karine Kenis 1,Els Kesters 1,Toan Quoc Le 1,Paul Mertens 1,Antoine Pacco 1,Jens Rip 1,Farid Sebaai 1,Samuel Suhard 1,Amir Tamaddon 1,Dennis Van Dorp 1,Guy Vereecke 1,Nandi Vrancken 3,Kurt Wostyn 1,Xiumei Xu 1,Frank Holsteyns 1

1 IMEC Leuven Belgium,2 Chemistry KULeuven Leuven Belgium,1 IMEC Leuven Belgium2 Chemistry KULeuven Leuven Belgium,1 IMEC Leuven Belgium1 IMEC Leuven Belgium,3 Chemistry VUB Brussel Belgium

Show Abstract

NT7.2: Poster Session
Session Chairs
Tuesday PM, March 29, 2016
Sheraton, Third Level, Phoenix Ballroom

8:00 PM - NT7.2.01
The Effect of Copper Incorporation on Structural, Optical and Magnetic Properties of ZnO Nanoparticles

Ozlem Yildirim 1,Caner Durucan 2

1 Selcuk University Konya Turkey,2 METU Ankara Turkey

Show Abstract

8:00 PM - NT7.2.02
Mini Flowers ZnO Supported on Inorganic Compounds Used in the Removal of Dyes

Nayely Torres Gomez 1,Alfredo Rafael Vilchis Nestor 1,Gustavo Lopez Tellez 1,Edith Gutierrez Segura 1,Enrique Vigueras Santiago 1

1 Universidad Autónoma del Estado de México Toluca Mexico,

Show Abstract

2016-03-30   Show All Abstracts

Symposium Organizers

Manish Keswani, University of Arizona
Paul Mertens, IMEC
Kash Mittal, Reviews of Adhesion and Adhesives
Jin-Goo Park, Hanyang University

Symposium Support

Micron Foundation
PCT Systems, Inc.
Semiconductor Research Corporation
Tokyo Electron
NT7.3: Nanoparticle Removal I
Session Chairs
Manish Keswani
Jacques van der Donck
Wednesday AM, March 30, 2016
PCC North, 100 Level, Room 128 A

9:00 AM - *NT7.3.01
Advances in Cryogenic Gas Cleaning for Nanoparticle Removal

Jeffery Butterbaugh 1,Chimaobi Mbanaso 1

1 TEL FSI, Inc. Chaska United States,

Show Abstract

9:30 AM - *NT7.3.02
Enhanced Nanoparticle Removal Using Surfactants

Michael Free 1

1 University of Utah Salt Lake City United States,

Show Abstract

10:00 AM -
BREAK

10:30 AM - NT7.3.03
Investigations of Acoustic Cavitation in Aqueous Surfactant Solutions for Megasonic Cleaning Applications

Mingrui Zhao 1,Anfal Alobeidli 1,Rajesh Balachandran 1,Petrie Yam 2,Claudio Zanelli 2,Sharyl Maraviov 3,Mona Nagel 4,Manish Keswani 1

1 University of Arizona Tucson United States,2 Onda Corporation Sunnyvale United States3 PCT Systems, Inc. Fremont United States4 Carl Zeiss Oberkochen Germany

Show Abstract

10:45 AM - *NT7.3.04
Advances in Aerosol Spray for Particle Removal without Damage

James Snow 1,Masanobu Sato 2,Takayoshi Tanaka 2

1 SCREEN SPE USA Pflugerville United States,2 SCREEN Semiconductor Solutions Co., Ltd. Hikone Japan

Show Abstract

11:15 AM - NT7.3.05
Relationship between Surface Damage and Particle Removal on Si Wafer during SC1 Cleaning Process for Si Wafer Fabrication

Hyun-Tae Kim 1,Sung-Hae Jang 1,In-Chan Choi 1,Minsu Kim 1,Jin-Goo Park 1

1 Hanyang University Ansan Korea (the Republic of),

Show Abstract

11:30 AM - *NT7.3.06
Fundamentals of Particle Removal by High Speed Air Jet and Enhancement Methods of the Removal Performance

Kuniaki Gotoh 1

1 Okayama University Okayama Japan,

Show Abstract

NT7.4: Nanoparticle Removal II
Session Chairs
Dongsik Kim
James Snow
Wednesday PM, March 30, 2016
PCC North, 100 Level, Room 128 A

1:30 PM - *NT7.4.01
Particle Removal Evolution Since the 1970s and up to Now

Steven Verhaverbeke 1

1 Applied Materials Inc San Francisco United States,

Show Abstract

2:00 PM - *NT7.4.02
Laser-Induced Spray Cleaning for Nanoscale Contaminant Removal from Solid Surfaces

Dongsik Kim 1,Changho Seo 1

1 POSTECH Pohang Korea (the Republic of),

Show Abstract

2:30 PM -
BREAK

3:00 PM - NT7.4.03
Characterization of Stable and Transient Cavitation in Dual- and Multiple-Frequency Systems Using a Hydrophone

Mingrui Zhao 1,Petrie Yam 2,Claudio Zanelli 2,Manish Keswani 1

1 University of Arizona Tucson United States,2 Onda Corporation Sunnyvale United States

Show Abstract

3:15 PM - NT7.4.04
Effect of Corrosion Inhibitor on Particle Contamination and Removal for Cu CMP Application

Byoung-Jun Cho 1,Jin-Yong Kim 1,Jin-Goo Park 1

1 Hanyang University Ansan Korea (the Republic of),

Show Abstract

3:30 PM - *NT7.4.05
Nanoscale Contaminant Removal Using CO2 Gas Cluster for Semiconductor Device

Taesung Kim 1,Yujin Cho 1,Hongyi Qin 1,Jongwoo Lee 2

1 Sungkyunkwan Univ Suwon Korea (the Republic of),2 Zeus Osan Korea (the Republic of)

Show Abstract