9:30 AM - **FF1.1
Nanoimprint Lithography for 3D Surface Nanostructuring and Photonic Devices.
C. Sotomayor Torres 1 2 3 , V. Reboud 1 , N. Kehagias 1 , M. Zelsmann 4 , P. Loveral 1 , F. Reuther 5 , G. Gruetzner 5 , G. Redmond 1 , C. Schuster 5 , M. Kubenz 5 Show Abstract
1 , Tyndall National Institute, Cork Ireland, 2 , Catalan Insitute of Nanotechnology, Bellaterra Spain, 3 , Spain and Catalan Insitute for Research and Advanced Studies ICREA, Barcelona Spain, 4 , LTM-CNRS, Grenoble France, 5 , Micro Resist Technology GmbH, Berlin Germany
Three-dimensional (3D) nanopatterning is an enabling fabrication technology with impact in several research fields and application areas . The latter includes, for example, advanced optical elements  and circuits, adaptive optics, biosensors, supramolecular chemistry, studies of cell behaviour in 3D among others.In this presentation we will review the state of the art in top-down, bottom-up and mix-and-match 3D nanopatterning methods, considering their advantages and disadvantages from the perspective of becoming a technology. Examples of combinatory approaches will be provided, for example, Reverse UV-NIL  among others. Some of the specific challenges faced in 3D nanofabrication for photonic and biological applications will be discussed. The example of a polymer photonic crystal band edge laser made by nanoimprint lithography will be presented.The support of the EC-funded project NaPa (Contract No. NMP4-CT-2003-500120), of the EC-funded project PHOREMOST (FP6/2003/IST/2-511616) and of Science Foundation Ireland is gratefully acknowledged. The content of this work is the sole responsibility of the authors.References:1. K. J . Vahala, Nature 424, 839 (2003)2. S. Y. Lin, J. G. Fleming, D. L. Hetherington, B. K. Smith, R. Biswas, K. M. Ho, M. M. Sigalas, W. Zubrzycki, S. R. Kurtz & Jim Bur, Nature, 294, 251 (1998),3. N. Kehagias, V. Reboud, G. Chansin, M. Zelsmann, C. Jeppesen, C. Schuster, M. Kubenz, F. Reuther, G. Gruetzner and C. M. Sotomayor Torres, Reverse contact UV nanoimprint lithography for multilayered structure fabrication, Nanotechnology, 18, 175303, (2007)
10:00 AM - FF1.2
Nanoimprint Lithography Molding of ``Clickable" Polymer Patterns.
Yuval Ofir 1 , Brian Jordan 1 , Bappaditya Samanta 1 , Isaac Moran 2 , Kenneth Carter 2 , Vincent Rotello 1 Show Abstract
1 Chemistry, University of Massachusetts Amherst, Amherst, Massachusetts, United States, 2 Polymer Science and Engineering, University of Massachusetts Amherst, Amherst, Massachusetts, United States
Imprint lithography techniques, including nanocontact molding, show great promise in the ability to generate nanoscale patterns