Call for Papers

Please contact the symposium organizers with questions.

Surfaces and interfaces have become increasingly important factors for the integration of emerging materials and the implementation of latest fabrication processes into new generation of electronic and photonic devices. When interfaces are formed at the junction between materials surfaces with dissimilar properties, surprising new properties not present in either parent phase emerge at the intersection. These intriguing interfacial properties play key roles in organizing the multilayered device structures and modulating the charge-transfer dynamics across connecting layers. As system dimensions are scaled downward for future electronic device applications and heterogeneous integration of inorganic and organic surfaces are getting prevalent in wearable devices, the nature and complexity of materials interfaces bring tremendous challenges to scientists and engineers resulting in slowing down the progress towards emerging applications. Advanced characterization techniques to study these complex interfaces accurately are also rare. Methods of film and surface preparation and interface formation are often coupled, and they significantly affect the operation of devices. Thus, this symposium is aimed at bringing together experts in the different aspects of materials surfaces and interfaces ranging from advanced characterization, to unconventional film-growth, patterning and device level integration. Both experimental and theoretical papers are welcome. Special emphasis will be given to papers in areas of in-situ characterization techniques as well as modelling and multiscale simulations.

Joint sessions with other symposium will be considered.

Topics will include:

• Interfaces in area-selective ALD enabled nanopatterns
• Self-assembled monolayers (SAM) growth and in-situ characterization
• Next generation interconnects-interfacial challenges
• Surface activation, deactivation, patterning, and spectroscopic studies
• Mechanistic understanding of interface defect formation and mitigation
• Surface characterization techniques and metrology innovation
• Hybrid (inorganic/organic) interfaces in flexible electronics and additive manufacturing
• Interfacial challenges in printed hybrid electronics
• Emerging deposition equipments
• Control of surfaces, interfaces and grain-boundaries to tailor properties and functionalities
• Surfaces of emerging electronic and photonic materials
• Interface engineering in emerging photovoltaics

Invited Speakers:

• Rebecca Kramer-Bottiglio (Yale University, USA)
• Tse Nga Ng (University of California, San Diego, USA)
• Erwin Kessels (Eindhoven University, Netherlands)
• Julien Bachmann (Friedrich-Alexander-Universität Erlangen-Nürnberg, Germany)
• Derya Baran (King Abdullah University of Science and Technology, Saudi Arabia)
• Stacey F. Bent (Stanford University, USA)
• John Conley (Oregon State Universtiy, USA)
• Catherine Dubourdieu (Helmholtz-Zentrum Berlin and Freie Universität Berlin, Germany)
• Steven George (University of Colorado Boulder, USA)
• Angel Yanguas Gil (Argonne National Laboratory, USA)
• Richard Haight (IBM T.J. Watson Research Center, USA)
• Melissa Hines (Cornell University, USA)
• Andrew C. Kummel (University of California, San Diego, USA)
• Adrie Mackus (Technische Universiteit Eindhoven, Netherlands)
• Ola Nilsen (University of Oslo, Norway)
• Ralph G. Nuzzo (University of Illinois at Urbana-Champaign, USA)
• Robert Opila (University of Delaware, USA)
• Jeongwon Park (University of Ottawa, Canada)
• Sang-Hee Park (Korea Advanced Institute of Science and Technology, Republic of Korea)
• Gregory Parsons (North Carolina State University, USA)
• Riikka Puurunen (Aalto University, Finland)

Symposium Organizers