Chairs
Panos Andricacos -- IBM T.J. Watson Research Ctr
Sean Corcoran -- Naval Research Laboratory
Jean Delplancke -- Univ Libre de Brussels
Thomas Moffat -- NIST
Peter Searson -- Johns Hopkins Univ
Symposium Support
- Digital Instruments, Inc.
- National Science Foundation
- Solartron Instruments
- TopoMetrix Corp.
* Invited paper
SESSION P1: FUNDAMENTALS OF FILM GROWTH AND DISSOLUTION
Chairs: Sean G. Corcoran Thomas P. Moffat and Peter C. Searson
Monday Morning, December 2, 1996
Providence/Orleans (M)
8:30 AM P1.1
KINETIC MODEL FOR LAYER-BY-LAYER HOMOEPITAXIAL GROWTH, Vladimir I. Trofimov, Vladimir Mokerov, Alexandr Shumyankov, Inst of Radio Engr & Electronics , Moscow, RUSSIA.
8:45 AM *P1.2
THE SOLID/LIQUID INTERFACE - AN ATOMIC VIEW ON STEP FLUCTUATIONS AND ELECTROCHEMICAL DISSOLUTION, Margret Giesen, Dietmar Stapel, Georg Schulze Icking-Konert, Harald Ibach, Forschungszentrum Julich, IGV, Julich, GERMANY; Michael Dietterle, Univ Ulm, Abteilung fur Elektrochemie, Ulm, GERMANY; Dieter M Kolb, Univ Ulm, Dept of Electrochemistry, Ulm, GERMANY.
9:15 AM P1.3
NUCLEATION, GROWTH, KINETIC ROUGHENING, AND POST-DEPOSITION PROCESSES IN Ag/Ag(100) FILMS, James Evans, Maria C. Bartelt, C.-M. Zhang, J.-M. Wen, C. Stoldt, Iowa State Univ, IPRT, Ames, IA; C. J. Jenks, Iowa State Univ, Ames, IA; P. A. Thiel, Iowa State Univ, IPRT, Ames, IA.
9:30 AM P1.4
SILVER DEPOSITION AND DISSOLUTION AT LOW OVERPOTENTIALS, Karl Sieradzki, Arizona State Univ, Dept of Mech & Aerospace Engr, Tempe, AZ; Stanko R. Brankovic, Arizona State Univ, Science & Engineering of Materials , Tempe, AZ; Nikolay Dimitrov, Arizona State Univ, Dept of Mech & Aerospace Engr, Tempe, AZ.
9:45 AM BREAK
10:15 AM *P1.5
STUDIES OF Cu DEPOSITION ONTO METAL AND SEMICONDUCTOR ELECTRODES AT THE ATOMIC LEVEL, Dieter M Kolb, Univ Ulm, Dept of Electrochemistry, Ulm, GERMANY.
10:45 AM P1.6
EMBEDDED ATOM MODEL OF SURFACE STRESS AND EARLY FILM GROWTH IN ELECTRODEPOSITION: Ag/Au (111), Michael Haftel, Naval Research Laboratory, Code 6651, Washington, DC; Mervine Rosen, Naval Research Laboratory, Nanostructure Optics Section, Washington, DC; Sean G. Corcoran, Naval Research Laboratory, Washington, DC.
11:00 AM P1.7
MICROMECHANICAL STRESS SENSORS FOR ELECTROCHEMICAL STUDIES, Trevor Rayment, Tom A. Brunt, Cambridge Univ, Dept of Chemistry, Cambridge, UNITED KINGDOM; Sean J. O'Shea, Mark E. Welland, Cambridge Univ, Dept of Engineering, Cambridge, UNITED KINGDOM.
11:15 AM P1.8
DIFFUSION AND GROWTH OF THIN Ag FILMS ON Pt(111), Christian Ratsch, Matthias Scheffler, Fritz-Haber-Inst, Abteilung Theorie, Berlin, GERMANY.
11:30 AM P1.9
IN-SITU STM STUDIES OF THE ELECTRODEPOSITION OF ULTRATHIN NICKEL FILMS, Olaf M. Magnussen, Brookhaven National Laboratory, Dept of Physics, Upton, NY; Andreas Lachenwitzer, Franz Meoller, Jeurgen Behm, Univ Ulm, Abteilung Oberfl, Ulm, GERMANY.
11:45 AM P1.10
TIME-RESOLVED MEASUREMENTS OF OVERLAYER ORDERING IN ELECTRODEPOSITION, Adam C. Finnefrock, Cornell Univ, Dept of Physics, Ithaca, NY; Hector D. Abruna, Cornell Univ, Dept of Chemistry, Ithaca, NY; P. David Ting, Cornell Univ, Dept of Applied & Engr Physics, Ithaca, NY; Kristin L. Ringland, Cornell Univ, Dept of Physics, Ithaca, NY; Lisa J. Buller, Cornell Univ, Dept of Chemistry, Ithaca, NY; Joel D. Brock, Cornell Univ, Ithaca, NY.
SESSION P2: FUNDAMETALS OF FILM GROWTH AND DISSOLUTION
Chairs: Sean G. Corcoran and Thomas P. Moffat
Monday Afternoon, December 2, 1996
Providence/Orleans (M)
1:30 PM *P2.1
HALIDE ADLAYERS: FROM LATTICE GASSES TO INCOMMENSURATE STRUCTURES, Benjamin M. Ocko, Brookhaven National Laboratory, Dept of Physics, Upton, NY; J. X. Wang, Brookhaven National Laboratory, Dept of Applied Science, Upton, NY; T. Wandlowski, Univ Ulm, Dept of Electrochemistry, Ulm, GERMANY.
2:00 PM P2.2
LATTICE-GAS MODELS OF ELECTROCHEMICAL ADSORPTION:
STATIC AND DYNAMICAL ASPECTS, Per Arne Rikvold, Florida State Univ, Center for Materials Research & Technology , Tallahassee, FL; Andrzej Wieckowski, Univ of Illinois-Urbana, Dept of Chemistry, Urbana, IL; Raphael A. Ramos, Florida State Univ, Center for Materials Research & Technology , Tallahassee, FL.
2:15 PM P2.3
STM STUDY OF ADSORPTION AND ELECTRODEPOSITION ON COPPER IN ACID CHLORIDE MEDIA, Thomas P. Moffat, NIST, MS&E Lab, Gaithersburg, MD.
2:30 PM P2.4
CHARACTERIZATION OF ETCHING PROCESSES ON Cu SURFACES, C. Y. Nakakura, Yale Univ, Dept of Applied Physics, New Haven, CT; V. M. Phanse, G. Zheng, Eric J. Altman, Yale Univ, Dept of Chemical Engr, New Haven, CT.
2:45 PM P2.5
GROWTH, STRUCTURE AND CHARACTERIZATION OF ELECTRODEPOSITED Co/Cu ULTRATHIN FILMS AND MULTILAYERS, Yukimi Jyoko, Satoshi Kashiwabara, Yasunori Hayashi, Kyushu Univ, Dept of MS&E, Fukuoka, JAPAN.
3:00 PM BREAK
3:30 PM P2.6
SELECTIVE DISSOLUTION OF Ag-Au AND Cu-Au ALLOYS BELOW THE CRITICAL POTENTIAL, Karl Sieradzki, Arizona State Univ, Dept of Mech & Aerospace Engr, Tempe, AZ; Kimberly Wagner, Arizona State Univ, Dept of Electrical Engr, Tempe, AZ.
3:45 PM *P2.7
PASSIVATION OF BINARY ALLOYS, R. C. Newman, UMIST, Corrosion & Protection Centre, Manchester, UNITED KINGDOM.
4:15 PM P2.8
IN SITU SMALL ANGLE NEUTRON SCATTERING OF THE FORMATION OF NANOPOROUS=
GOLD BY ELECTROCHEMICAL DISSOLUTION, Sean G. Corcoran, Naval Research Laboratory, Washington, DC; Karl Sieradzki, Arizona State Univ, Dept of Mech & Aerospace Engr, Tempe, AZ; David Wiesler.
4:30 PM *P2.9
SYNTHESIS OF MODIFIED ELECTRODES THROUGH SPONTANEOUS ADSORPTION OF INORGANIC MATERIALS, Andrew A. Gewirth, Univ of Illinois-Urbana, Dept of Chemistry, Urbana, IL.
SESSION P3/EE4: PATTERN FORMATION DURING FILM GROWTH
Chairs: Thomas C. Halsey and Peter C. Searson
Tuesday Morning, December 3, 1996
Constitution (S)
9:00 AM *P3.1/EE4.1
SURFACE EVOLUTION AND MORPHOLOGY IN ELECTROCHEMICAL PROCESSES: FROM DENDRITIC TO EPITAXIAL GROWTH, Fereydoon Family, Emory Univ, Dept of Physics, Atlanta, GA.
9:30 AM P3.2/EE4.2
ADMITTANCE SPECTROSCOPY OF FRACTAL ELECTRODE-ELECTROLYTE INTERFACES, David G. Grier, Amy E. Larsen, Univ of Chicago, James Franck Inst, Chicago, IL; Thomas C. Halsey, Exxon Research & Engineering Co, Annandale, NJ.
10:00 AM P3.3/EE4.3
MORPHOLOGICAL PATTERN FORMATION DURING QUASI-TWO-DIMENSIONAL ELECTRODEPOSITION, Jacob Jorne, Sen-Wei Wu, Univ of Rochester, Dept of Chemical Engr, Rochester, NY.
10:30 AM *P3.4/EE4.4
BACTERIAL SELF-ORGANIZING SYSTEMS - PROTEUS SWARM COLONIES, James A. Shapiro, Univ of Chicago, Dept of Biochem & Molecular Bio, Chicago, IL; Sergei Esipov, Univ of Chicago, James Franck Inst, Chicago, IL.
11:00 AM P3.5/EE4.5
A DYNAMICAL-GEOMETRICAL MODEL FOR PLANT CELL WALL TEXTURE FORMATION, Bela M. Mulder, FOM Inst, Dept of Atomic & Molecular Physics, Amsterdam, NETHERLANDS; Anne-Mie C. Emons, Wageningen Agriculatural Univ, Dept of Plant Cytology & Morphology, Wageningen, NETHERLANDS.
11:15 AM P3.6/EE4.6
THE PHYSICS OF EMBRYOLOGY, James A. Glazier, Univ of Notre Dame, Dept of Physics, Notre Dame, IN; Jose C.M. Mombach, UFRGS, Inst de Fisica, Porto Alegre, BRAZIL; Richard Raphael, Mark Zajac, Marius Asipauskas, Arpita Upadhyaya, Univ of Notre Dame, Dept of Physics, Notre Dame, IN.
11:30 AM P3.7/EE4.7
IRREVERSIBLE DEPOSITION OF PARTICLES ON SOLID SURFACES, Elizabeth K. Mann, P. Schaaf, Inst Charles Sadron, CNRS, Strasbourg, FRANCE; B. Senger, P. Lavalle, Unite INSERM 424, Centre de Recherche Odontologique, Strasbourg, FRANCE; M. Ostafin, Inst Charles Sadron, Strasbourg, FRANCE.
SESSION P4: FUNDAMENTALS OF FILM GROWTH
Chairs: Sean G. Corcoran and Peter C. Searson
Tuesday Afternoon, December 3, 1996
Providence/Orleans (M)
1:30 PM P4.1
SELF-ASSEMBLED ORGANIC MONOLAYER FILMS ON UNDERPOTENTIALLY DEPOSITED METAL LAYERS, Paul E. Laibinis, MIT, Dept of Chemistry, Cambridge, MA; G. Kane Jennings, MIT, Cambridge, MA.
1:45 PM *P4.2
ELECTROCHEMICAL SYNTHESIS OF HETEROEPITAXIAL MOLECULAR FILMS ON ORDERED SUBSTRATES, Michael D. Ward, Univ of Minnesota, Dept of CE&MS, Minneapolis, MN; Andrew C. Hillier, Univ of Virginia, Dept of Chemical Engr, Charlottesville, VA; Julie A. Last, Univ of Minnesota, Dept of Chemical Engr & Matls Science, Minneapolis, MN.
2:15 PM P4.3
EPITAXIAL GROWTH OF ORGANIC MOLECULES ON VICINAL SURFACES OF SINGLE CRYSTALS, Toshihiro Shimada, Takafumi Sakurada, Atsushi Koma, Univ of Tokyo, Dept of Chemistry, Tokyo, JAPAN.
2:30 PM BREAK
3:00 PM *P4.4
STM STUDIES OF ELECTRODE/ELECTROLYTE INTERFACES AND SILICON SURFACE REACTIONS IN CONTROLLED ATMOSPHERES, Christopher E. Chidsey, Christopher P. Wade, Stanford Univ, Dept of Chemistry, Stanford, CA.
3:30 PM *P4.5
ATOMIC STRUCTURE AND MOLECULAR MODIFICATIONS OF SILICON SURFACES, Philippe Allongue, Catherine Henry de Villeneuve, ESPCI, Dept de Physique des Liquides et Electrochimie, Paris, FRANCE; J. Pinson, Univ de Paris VII, Lab de'Electrochimie Moleculaire, Paris, FRANCE; F. Ozanam, Ecole Polytechnique , Lab de Physique de la Matiere Condensee, Palaiseau, FRANCE; Jean-Noel Chazalviel, Ecole Polytechnique , Lab Physique de la Matiere Condensee, Palaiseau, FRANCE.
4:00 PM P4.6
CHARACTERIZATION OF THE SILICON/FLUORIDE INTERFACE BY INSITU MICROWAVE REFLECTIVITY, Arun Natarajan, Peter C. Searson, Gerko Oskam, Johns Hopkins Univ, Dept of MS&E, Baltimore, MD.
4:15 PM P4.7
IN-SITU CHARACTERIZATION OF THE SURFACE STATE DENSITY BY PHOTOLUMINESCENCE DURING ELECTROCHEMICAL TREATMENTS OF SILICON SURFACES, Thomas Dittrich, Technische Univ Munich, Dept of Physics, Garching, GERMANY; Victor Yu. Timoshenko, Moscow State Univ, Faculty of Physics, Moscow, RUSSIA; J. Rappich, Hahn-Meitner-Inst, Ateilung Photovoltaik, Berlin, GERMANY.
4:30 PM P4.8
ELECTROLYTE ELECTRO-REFLECTANCE OF BORON PHOSPHIDE (BP), Egbert Schroten, Joop Schoonman, Albert Goossens, Delft Univ of Technology, Applied Inorganic Chemistry Lab, Delft, NETHERLANDS.
4:45 PM P4.9
INFLUENCE OF A SILICON CAP ON SiGe PASSIVATION BY ANODIC OXIDATION, J. Rappich, Hahn-Meitner-Inst, Ateilung Photovoltaik, Berlin, GERMANY; I. Sieber, A. Schopke, W. Fussel, Hahn-Meitner-Inst, Abteilung Photovoltaik, Berlin, GERMANY; M. Gluck, J. Hersener, Daimler-Benz Forschungszentrum Ulm, Ulm, GERMANY.
SESSION P5: ELECTRODEPOSITION AND ETCHING OF COMPOUND SEMICONDUCTORS
and ELECTRODEPOSITION OF METALS ON SEMICONDUCTORS
Chairs: Jean Luc Delplancke and Gerko Oskam
Wednesday Morning, December 4, 1996
Providence/Orleans (M)
8:30 AM *P5.1
CHEMICAL AND ELECTROCHEMICAL HETEROEPITAXIAL GROWTH OF CHALCOGENIDE SEMICONDUCTORS FROM SOLUTIONS, Daniel Lincot, Mark Furlong, Ecole Normale Superiere, Lab d'Electrochimie de Chimie Analytique, Paris, FRANCE; Michel Froment, Univ Pierre et Marie Curie, Physique des Liquides, Paris, FRANCE; Marie Claude Bernard, Univ Pierre et Marie Curie, Physique des Liquides , Paris, FRANCE; Robert Cortes, Univ Pierre et Marie Curie, Physique des Liquides, Paris, FRANCE.
9:00 AM *P5.2
ATOMIC LEVEL ELECTROCHEMICAL PROCESSING OF COMPOUND SEMICONDUCTORS, John L. Stickney, Univ of Georgia, Dept of Chemistry, Athens, GA.
9:30 AM P5.3
UHV-MODEL EXPERIMENTS OF ELECTROCHEMICAL ETCHING OF GaAs BY H2O, Br2, Wolfram Jaegermann, Hahn-Meitner-Inst, Grenzflaechen, Berlin, GERMANY; Oliver Henrion, Hahn-Meitner-Inst, Grenzffchen, Berlin, GERMANY; Andreas Klein, Christian Pettenkofer, Hahn-Meitner-Inst, Grenzflaechen, Berlin, GERMANY.
9:45 AM P5.4
SCANNING PROBE INVESTIGATIONS OF OXIDATION OF CLEAVED HETEROSTRUCTURE LAYERS, John L. Ebel, Air Force Wright Laboratory, WL/AADD, Wright-Patterson AFB, OH; T. E. Schlesinger, Michael L. Reed, Carnegie Mellon Univ, Dept of Electrical & Computer Engr, Pittsburgh, PA.
10:00 AM BREAK
10:30 AM *P5.5
ELECTROCHEMICAL METAL DEPOSITION ON SILICON, Gerko Oskam, Peter C. Searson, Maria Nikolova, John G. Long, Johns Hopkins Univ, Dept of MS&E, Baltimore, MD.
11:00 AM P5.6
THE EFFECT OF HF AND H
BO
ON THE ELECTROCHEMICAL DEPOSITION OF Cu ON n-Si, C. M. Hasenack, Univ de Sao Paulo, LSI/PEE/EPUSP, Sao Paulo, BRAZIL; P.C.T. D'Ajello, UFSC, Dept de Fisica, Florianopolis, BRAZIL; L. F.O. Martins, UFSC, Dept of Physics, Florianopolis, BRAZIL; S. G. dos Santos, Univ of Sao Paulo, LSI/PEE/EPUSP, Sao Paulo, BRAZIL.
11:15 AM P5.7
DISCRETE METAL DEPOSITION ON HYDROGEN TERMINATED SILICON SURFACES: KINETICS, MORPHOLOGIES AND SENSOR APPLICATIONS, Oliver Chyan, Steve Chien, Junjun Wu, Jin-Jian Chen, Univ of North Texas, Dept of Chemistry, Denton, Texas.
11:30 AM P5.8
MODIFICATION OF THE SILICON SURFACE BY ELECTROLESS PLATINUM DEPOSITION FROM FLUORINATED SOLUTIONS, Juan Ramon Morante, Univ de Barcelona, Dept de Fisica Aplicada i Electronica, Barcelona, SPAIN; Pau Gorostiza, Fausto Sanz, Jordi Servat, Raul Diaz, Univ de Barcelona, Departament de Quimica Fisica, Barcelona, SPAIN.
11:45 AM P5.9
ULTRATHIN ELECTRODEPOSITED Ni-Cu FILMS ON n-GaAs, M. G. Darbyshire, A. Bewick, W. Schwarzacher, H.H. Willis Physics Laboratory, Bristol, UNITED KINGDOM; C. Younes, Interface Analysis Centre, Bristol, UNITED KINGDOM.
SESSION P6: ELECTRODEPOSITION AND MODIFICATION OF OXIDE ELECTRODES
Chairs: Jean Luc Delplancke and Jay A. Switzer
Wednesday Afternoon, December 4, 1996
Providence/Orleans (M)
1:30 PM P6.1
ELECTRODEPOSITION OF QUANTUM-CONFINED METAL/SEMICONDUCTOR NANOCOMPOSITES, Jay A. Switzer, Eric W. Bohannan, Teresa D. Golden, Chen-Jen Hung, Univ of Missouri-Rolla, Rolla, MO; Mark Shumsky, Univ of Missouri-Rolla, Dept of Ceramic Engr, Rolla, MO.
1:45 PM *P6.2
MICROELECTROCHEMICAL CHARACTERIZATION AND MODIFICATION OF SEMICONDUCTOR SURFACES, Alexander Michaelis, Univ of North Carolina, Dept of Chemistry, Chapel Hill, NC; Stephan Kudelka, Joachim W. Schultze, Heinrich-Heine-Univ Dusseldorf, Inst fur Phys Chemie & Elektrochemie, Dusseldorf, GERMANY.
2:15 PM P6.3
ELECTROCHEMICAL SURFACE AND BULK MODIFICATION OF MBE GROWN La
CuO
a- and c-AXIS FILMS, Jean Fompeyrine, IBM Zurich,; A. Dardion, Univ de Bern, Inst Anorganische Chemie, Bern, SWITZERLAND; H. Siegenthaler, Univ de Bern, Inst fur Anorganische Chemie, Bern, SWITZERLAND; Erica J. Williams, IBM Zurich, Research Lab, Ruschlikon, SWITZERLAND; F. Arrouy, E. Machler, Jean-Pierre Locquet, IBM Zurich, Research Div, Ruschlikon, SWITZERLAND.
2:30 PM P6.4
IN SITU INVESTIGATION OF WORKING BATTERY ELECTRODES USING SYNCHROTRON
X-RAY DIFFRACTION, N. M. Jisrawi, Birzeit Univ, Dept of Physics, Birzeit, ISRAEL; T. R. Thurston, Brookhaven National Laboratory, Dept of Physics, Upton, NY; X. Q. Yang, S. Mukerjee, J. McBreen, Brookhaven National Laboratory, Dept of Applied Science, Upton, NY; M. L. Daroux, X. K. Xing, Gould Inc, Eastlake, OH.
2:45 PM BREAK
3:15 PM *P6.5
POLYPYRROLE GROWTH ON YBa
Cu
O
MODIFIED WITH A SELF-ASSEMBLED MONOLAYER OF N-(3-AMINOPROPYL) PYRROLE: HARDWIRING THE ELECTROACTIVE ''HOT SPOTS'' ON A SUPERCONDUCTOR ELECTRODE, John T. McDevitt, Univ of Texas-Austin, Dept of Chemistry & Biochem, Austin, TX; Rung-Kuang Lo, Univ of Texas, Austin, TX; Jason E. Ritchie, Univ of Texas-Austin, Austin, TX; Ji-Ping Zhou, Jianai Zhao, Univ of Texas-Austin, Dept of Chemistry & Biochem, Austin, TX; Feng Xu, Chad A. Mirkin, Northwestern Univ, Dept of Chemistry, Evanston, IL.
3:45 PM P6.6
ELECTROCHEMICAL MODIFICATION OF
: THE ROLE PLAYED BY MICROSTRUCTURE, Erica J. Williams, IBM Zurich, Research Lab, Ruschlikon, SWITZERLAND; A. Daridon, F. Arrouy, E. Machler, IBM Zurich, Research Div, Ruschlikon, SWITZERLAND; H. Siegenthaler, Univ de Bern, Inst fur Anorganische Chemie, Bern, SWITZERLAND; Jean-Pierre Locquet, IBM Zurich, Research Div, Ruschlikon, SWITZERLAND.
4:00 PM P6.7
ELECTRODEPOSITION AND STRUCTURAL PROPERTIES OF WO
THIN FILMS, E. A. Meulenkamp, Philips Research Laboratories, Eindhoven, NETHERLANDS.
4:15 PM P6.8
BULK RECONSTRUCTION OF AMORPHOUS THIN FILMS DUE TO FILM-ELECTROLYTE INTERFACE, Irina Shiyanovskaya, SUNY-Potsdam, Dept of Chemistry, New York, NY.
4:30 PM P6.9
ELECTROCHEMICAL SYNTHESIS AND PROPERTIES OF FERRIC AQUAPENTACYANOFERRATE, Igor Konovalov, Toronto, CANADA; Yu Goffsov, Inst of Physical Chemistry, Kiev, UKRAINE; V. Nechitayilo, V. Styopkin, Inst of Physics, Kiev, UKRAINE; Zinaida Tkachenko, Inst of Physics, Dept of Physical Electronics, Kiev, UKRAINE.
4:45 PM P6.10
ELECTROLESS DEPOSITION OF La
Sr
MnO
PEROVSKITE FILM ON YTTRIA STABILIZED ZIRCONIA SUBSTRATE, Takeshi Sasaki, Nat Inst of Matls & Chem Res, Dept of Composite Matls, Ibaraki, JAPAN; Y. Matsumoto, Kumamoto Univ, Dept of Applied Chemistry & Biochem.
SESSION P7: POSTER SESSION:
ELECTROCHEMICAL SYNTHESIS AND MODIFICATION OF MATERIALS
Chairs: Thomas P. Moffat and Peter C. Searson
Wednesday Evening, December 4, 1996
8:00 P.M.
Grand Ballroom/Constitution (S)
P7.1
A STUDY OF Si(111), Si(100),
, AND
SUBSTRATE ETCHING BY ATOMIC FORCE MICROSCOPY, Tom E. Daley, Gregory W. Auner, Wayne State Univ, Dept of ECE, Detroit, MI; G. Y. Liu, Wayne State Univ, Dept of Chemistry, Detroit, MI; Ratna Naik, Wayne State Univ, Dept of Physics & Astronomy, Detroit, MI; Vaman Naik, Univ of Michigan, Dept of Natural Sciences, Dearborn, MI.
P7.2
POROUS GaAs, Sergey Alexandrov Gusev, Yurii N. Drozdov, Evgenii B. Kluenkov, Andrey K. Vorobiev, Yurii N. Buzinin, Russian Academy of Sciences, Inst for Physics of Microstructures, Nizhny Novgorod, RUSSIA.
P7.3
ON THE SMOOTHING EFFECT OF SILICON DURING ANODIC OXIDATION, J. Rappich, Hahn-Meitner-Inst, Ateilung Photovoltaik, Berlin, GERMANY; I. Sieber, Hahn-Meitner-Inst, Abteilung Photovoltaik, Berlin, GERMANY; M. Gluck, J. Hersener, Daimler-Benz Forschungszentrum Ulm, Ulm, GERMANY; W. Fussel, Hahn-Meitner-Inst, Abteilung Photovoltaik, Berlin , GERMANY.
P7.4
STRUCTURE AND MAGNETIC PROPERTIES OF ELECTRODEPOSITED COBALT PLATINUM MULTILAYERS, Satoshi Kashiwabara, Yukimi Jyoko, Yasunori Hayashi, Kyushu Univ, Dept of MS&E, Fukouka, JAPAN.
P7.5
ELECTODEPOSITION OF CuCO MULTILAYERS, Thomas P. Moffat, NIST, MS&E Lab, Gaithersburg, MD.
P7.6
MICROSTRUCTURE OF ANODIZED ALUMINUM AND ITS EFFECTS ON OUTGASSING, Sarah M. Biedrzycki, Supapan Seraphin, Univ of Arizona, Dept of MS&E, Tucson, AZ; Ellis G. Bohon, Eric I. Shero, Shadman Farhang, Univ of Arizona, Dept of Chemical & Env Engr, Tucson, AZ.
P7.7
STUDY OF SURFACE STATES OF A MONOLAYER-BULK SYSTEM, Fredy R. Zypman, Univ of Puerto Rico, Humacao, PR; Luis F. Fonseca, Lesser Blum, Univ of Puerto Rico, Dept of Physics, San Juan, PR.
P7.8
STM CONTACT CONDUCTANCE JUMPS AT AMBIENT CONDITIONS, Sergei Shapoval, Inst Microelectronics Technology, RAS, Chernogolovka, RUSSIA; Vjatcheslav Dremov, Inst Microelectronics Technology, Expitaxial Structures Lab, Chernogolovka, RUSSIA.
P7.9
THE ROLE OF COULOMB FORCES IN QUASI-TWO DIMENSIONAL ELECTROCHEMICAL DEPOSITION, Pablo Mocskos, Univ of Buenos Aires, Dept of Electrical Engr, Buenos Aires, ARGENTINA; Guillermo Marshall, Univ de Buenos Aires, Wilde, ARGENTINA.
P7.10
MAGNETIC AND STRUCTURAL PROPERTIES OF ELECTRODEPOSITED Co-Ni-P AMORPHOUS RIBBONS, Guillermo Rivero, M. Multigner, J. M. Garcia, P. Crespo, A. Hernando, Inst Magnetismo Aplicado, Madrid, SPAIN.
P7.11
ELECTROCHEMICAL PREPARATION OF AMORPHOUS FeB FILMS WITH A LARGE QUANTITY OF PLASTICS, M. Inoue, Toyohashi Univ of Technology, Dept of Elect & Electronic Engr, Aichi, JAPAN; P. B. Lim, Toyohashi Univ of Technology, Dept of Electrical & Electronic Engr, Aichi, JAPAN; K. Nishimura, Toyohashi Univ of Technology, Dept of Elect & Electronic Engr, Toyohashi Aichi, JAPAN; P. T. Squire, Univ of Bath, Dept of Physics, Bath, UNITED KINGDOM; N. Fujita, Osaka Prefecture Univ, Dept of Electronics & Computer Science, Osaka, JAPAN; T. Fujii, Toyohashi Univ of Technology, Dept of Electrical & Electronic Engr, Toyohashi Aichi, JAPAN.
P7.12
ELECTROPLATING AND MATERIAL PROPERTIES OF PdCo ALLOY, Irina Boguslavsky, Bell Labs, Lucent Technologies, Murray Hill, NJ; Joseph A. Abys, AT&T Bell Laboratories, Murray Hill, NJ; Virginia T. Eckert, Bell Labs, Lucent Technologies, Murray Hill, NJ.
P7.13
THERMAL STABILITY OF ELECTRODEPOSITED NANOCRYSTALLINE Ni-Fe ALLOYS, F. Czerwinski, F. Megret, Jerzy A. Szpunar, McGill Univ, Dept of Metallurgical Engr, Montreal, CANADA; M. Aus, B. Szpunar, C. Cheung, Queen's Univ, Dept of Matls & Metallurgical Engr, Kingston, CANADA; Uwe Erb, ONERA, Dept of Matls & Metallurgical Engr, Kingston, CANADA.
P7.14
ELECTRODEPOSITION OF METALS ON CONDUCTIVE POLYMERS, Maria Hepel, Laura Adams, Cynthia Rice-Belrose, SUNY-Potsdam, Dept of Chemistry, Potsdam, NY.
P7.15
GROWTH CONTROL OF CYCLOPHOSPHAZENE-QUINONE COATING, Mira Josowicz, Pacific Northwest National Laboratory, Materials Research Center, Richland, WA; Jing Li, Pacific Northwest National Laboratory, Environmental Molecular Science Lab, Richland, WA.
P7.16
ELECTROCRYSTALLIZATION OF MOLECULAR FILMS ON ORDERED SUBSTRATES, Julie A. Last, Univ of Minnesota, Dept of Chemical Engr & Matls Science, Minneapolis, MN; Michael D. Ward, Univ of Minnesota, Dept of CE&MS, Minneapolis, MN; Daniel E. Hooks, Univ of Minnesota, Dept of Chemical Engr & Matls Science, Minneapolis, MN; Christopher Yip, Eli Lilly & Co, Lilly Research Lab.
P7.17
ALKANETHIOL MONOLAYERS ON GOLD: ELECTROCHEMICAL, INFRARED AND
SURFACE PLASMON RESONANCE DETECTION OF PHOTOLYTICALLY- AND
ELECTROLYTICALLY-INDUCED DEFECTS, Roger H. Terrill, Paul W. Bohn, Troy A. Tanzer, Univ of Illinois-Urbana, Dept of Chemistry, Urbana, IL.
P7.18
SIMULATION OF ADSORPTION-DESORPTION DYNAMICS AT A LIQUID-SOLID INTERFACE, Thomas Scott, Molecular Dynamics Inc, Wharton, NJ.
P7.21
ELECTROCHEMICAL SYNTHESIS OF POROUS COPOLYMERIC FILMS FROM AQUEOUS VINYL MONOMERS, Lidia GL. Kolzunova, Inst of Chemistry, Electrochmical Process Lab, Vladivostok, RUSSIA.
P7.22
ETCHING OF POLYMERS BY PHOTO-MATERIAL PROCESSING USING AN EXCIMER LAMP, Noritaka Takezoe, Atsushi Yokotani, Kou Kurosawa, Miyazaki Univ, Dept of Electrical & Electronic Engr, Miyazaki, JAPAN; Wataru Sasaki, Miyazaki Univ, Dept of Elect & Electronic Engr,; Kunio Yoshida, Osaka Univ, Electronic Engineering, Osaka, JAPAN; Tatsushi Igarashi, Hiromitsu Matsuno, USIO Inc, Research & Development Center, Himeji, JAPAN.
P7.23
HIGH RESOLUTION DISPLACEMENT OF FUNCTIONAL GROUPS TO FLUOROCARBON RESIN SURFACE BY USING ArF EXCIMER LASER, Tomoaki Shimizu, Masataka Murahara, Tokai Univ, Dept of Electrical Engr, Kanagawa, JAPAN.
P7.24
DEVELOPMENT OF CONTINUATION SURFACE MODIFICATION SYSTEM OF FLUOROCARBON RESIN FOR STRONG ADHESION, Ken Hatao, Masataka Murahara, Tokai Univ, Dept of Electrical Engr, Kanagawa, JAPAN; Kouichi Toyoda, Science Univ of Tokyo, Dept of Applied Electronics, Chiba, JAPAN.
P7.25
ELECTROCHEMICAL ATOMIC FORCE MICROSCOPY STUDY OF THE
DISSOLUTION KINETICS OF 304 STAINLESS STEEL, Thomas J. McKrell, Univ of Connecticut, Dept of Metallurgy, Storrs, CT; James M. Galligan, Univ of Connecticut, Inst of Materials Science, Storrs, CT.
P7.26
ELECTROCHEMICAL DECOMPOSITION MECHANISMS OF MOLYBDENUM NITRIDE ELECTRODES IN H
SO
ELECTROLYTE, Scott Roberson, R. F. Davis, North Carolina State Univ, Dept of MS&E, Raleigh, NC; Duane Finello, USAF Eglin AFB, MNMF/Fuzes Branch, Eglin AFB, FL.
P7.27
ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY, DC POLARIZATION AND CYCLIC VOLTAMMETRIC BEHAVIOR OF MICROWAVE PLASMA AND HOT FILAMENT CVD DIAMOND COATED MOLYBDENUM, MOLYBDENUM, AND PLATINUM SUBSTRATE MATERIALS, R. Ramesham, M F Rose, Auburn Univ, Space Power Inst, Auburn, AL.
P7.28
THE EFFECT OF CARBONATE-BICARBONATE CONCENTRATION ON EMPIRICAL CORROSION DIAGRAM OF MILD STEEL AS A MATERIAL OF GEOLOGICAL DISPOSAL PACKAGE FOR HIGH LEVEL NUCLEAR WASTES, Guen Nakayama, I-H Heavy Industries Co Ltd, Dept of Material Technology, Tokyo, JAPAN; M. Akashi, I-H Heavy Industries Co Ltd, Dept of Environmental Development, Tokyo, JAPAN.
P7.29
ELECTROCHEMICAL BEHAVIOR AND SURFACE MORPHOLOGY
OF VARIOUS FLAVORS OF COATED MATERIALS. II, Elia V. Eschenazi, Xavier Univ, Dept of Physics & Engineering, New Orleans, LA; Gary A. Glass, Univ of Southwest Louisiana, Dept of Physics, Lafayette, LA; Yamlak Tsega, Xavier Univ, Dept of Graduate Engr Science, New Orleans, LA; Ninja Van Ballard, Xavier Univ, Dept of Physics & Engineering, New Orleans, LA.
P7.30
CORROSION PROTECTION OF PARTICULATE ALUMINUM-MATRIX COMPOSITES BY ANODIZATION, Jiangyuan Hou, SUNY-Buffalo, Composite Matls Research, Buffalo, NY; Deborah D.L. Chung, SUNY-Buffalo, Dept of Mech & Aero Engr, Buffalo, NY.
P7.31
OPEN AIR FABRICATION OF Al
O
THIN FILMS AT ROOM TEMPERATURE, Toshio Okamoto, Masataka Murahara, Tokai Univ, Dept of Electrical Engr, Kanagawa, JAPAN; Kouichi Toyoda, Science Univ of Tokyo, Dept of Applied Electronics, Chiba, JAPAN.
P7.32
IN-SITU CHARACTERIZATION OF OXIDE FILMS ON LIQUID ALKALI METALS USING SECOND HARMONIC GENERATION (SHG), Holger C. Tostmann, Harvard Univ, Applied Sciences Div, Cambridge, MA; Detlef Nattland, Werner Freyland, Univ Karlsruhe, Inst fur Physikalische Chemie, Karlsruhe, GERMANY.
P7.33
OXIDATION OF LIQUID METAL SURFACES: IN-SITU UHV STUDIES USING X-RAY REFLECTIVITY, Michael J. Regan, Harvard Univ, Applied Sciences Div, Cambridge, MA; Moshe Deutsch, Bar-Ilan Univ, Dept of Physics, Ramat-Gan , ISRAEL; Benjamin M. Ocko, Elaine DiMasi, Olaf M. Magnussen, Brookhaven National Laboratory, Dept of Physics, Upton, NY; Peter S. Pershan, Holger C. Tostmann, Harvard Univ, Applied Sciences Div, Cambridge, MA.
P7.34
MAGNETORESISTIVE PROPERTIES OF QUASIPERIODIC METALLIC MULTILAYERS, Mutsuhiro Shima, Univ of Maryland, Dept of Matls & Nuclear Engr, College Park, MD; Lourdes Salamanca-Riba, Univ of Maryland, Dept of Matls & Nuclear Engr, College Park, MD.
P7.35
CHARACTERIZATIONS AND SYNTHESES OF Cu-C PSEUDOALLOY FILMS PREPARED BY R.F. SPUTTER DEPOSITION, J. P. Chu, National Taiwan Ocean Univ, Inst of Materials Eng, Keelung, TAIWAN.
P7.36
DIFFUSION AND ELECTROCHEMICAL INTERCALATION OF LITHIUM IN GRAPHITE ELECTRODE, Carmen Silva, Com Chilena de Energia Nculear, Nuclear Materials, Santiago, CHILE; E. Silva, Com Chilena de Energia Nculear, Dept of Nuclear Materials, Santiago, CHILE; G. Gonzalez, Univ de Chile, Dept of Quimica, Santiago, CHILE; F. Lang, A. Santana, Univ de Chile, Dept Quimica, Santiago, CHILE.
P7.37
AN ELECTROCHEMICAL STUDY ON THE GROWTH OF MULTILAYER FILM ELECTRODES MADE FROM THE CONDUCTING POLYMERS PPP, POT AND FROM THE COPOLYMER OF PPP AND POT, Carita Kvarnstrom, Abo Akademi Univ, Lab of Analytical Chemical, Abo, FINLAND; Rose-Marie Latonen, Ari Ivaska, Abo Akademi Univ, Lab of Analytical Chemistry, Abo, FINLAND.
P7.38
DISSOLUTION MECHANISM FOR P-Si DURING POROUS SILICON FORMATION, Jacob Jorne, Ying Kang, Univ of Rochester, Dept of Chemical Engr, Rochester, NY.
SESSION P8: ELECTRODEPOSITION OF METALS AND ALLOYS FOR MAGNETIC AND ELECTRONIC APPLICATIONS
Chairs: Panos C. Andricacos and Thomas P. Moffat
Thursday Morning, December 5, 1996
Providence/Orleans (M)
8:30 AM *P8.1
ELECTRODEPOSITION IN MAGNETIC RECORDING HEADS, Neil L. Robertson, IBM Almaden Research Center, San Jose, CA.
9:00 AM P8.2
FABRICATION AND CHARACTERIZATION OF NiFe THIN FILM COMPOSITION MODULATED
ALLOYS, Steven D. Leith, Univ of Washington, Dept of Chemical Engr, Seattle, WA; Daniel T Schwartz, Univ of Washington, Chemical Engineering, Seattle, Washington; Mehmet Sarikaya, Univ of Washington, Dept of MS&E, Seattle, WA.
9:15 AM *P8.3
ELECTRODEPOSITED MAGNETIC NANOSTRUCTURES, W. Schwarzacher, M. G. Darbyshire, A. Michel, G. Nabiyouni, Yi Ge, H.H. Willis Physics Laboratory, Bristol, UNITED KINGDOM; I. Bakonyi, E. Toth-Kadar, Research Inst for Solid State Physics, Budapest, HUNGARY.
9:45 AM BREAK
10:15 AM P8.4
NANOWIRES ELECTROCHEMICALLY GROWN IN POROUS TEMPLATES, Christian Schonenberger, Inst of Physics, Dept of Physics & Astronomy, Basel, SWITZERLAND; Bianca van der Zande, Philips Research Laboratories, Eindhoven, NETHERLANDS; Bart Fokkink, Inst of General Physics, Eindhoven, NETHERLANDS.
10:30 AM P8.5
ELECTROCHEMICAL FABRICATION OF THE NANO-WIRE ARRAYS:
TEMPLATE, MATERIALS AND APPLICATIONS, Dmitri Routkevitch, Univ of Toronto, Dept of Chemistry, Toronto, CANADA; Jingming Xu, Univ of Toronto, Dept of Electrical & Computer Engr, Toronto, CANADA; Martin Moskovits, Jimmy Chan, Univ of Toronto, Dept of Chemistry, Toronto, ON.
10:45 AM P8.6
"HETEROJUNCTIONS IN NANOWIRES BY ELECTROCHEMICAL PROCESSING", S. E. Gilbert, G. Redmond, EPFL, Inst de Physique Experimentale, Lausanne, SWITZERLAND; J. Tuaillon, EPFL, Inst de Pysique Experimentale, Lausanne, SWITZERLAND; B. Doudin, J.-Ph. Ansermet, EPFL, Inst de Physique Experimentale, Lausanne, SWITZERLAND.
11:00 AM P8.7
PRODUCTION OF MAGNETIC NANOPOWDERS BY PULSED SONOELECTROCHEMISTRY, Jean Luc Delplancke, Univ Libre de Brussels, Faculte des Sciences Appliquees, Bruxelles, BELGIUM; O Bouesnard, Univ Libre de Brussels, Metallurgie-Elecrochimie CP165, Bruxelles, BELGIUM; J Reisse, Univ Libre de Brussels, Metallurgie-Electrochimie CP165, Bruxelles, BELGIUM; R Winard, Univ Libre de Brussels, Metallurgie-Electrochimie CP 165, Bruxelles, BELGIUM.
11:15 AM *P8.8
ELECTRODEPOSITION FOR MEMS WITH SPECIAL REFERENCE TO FABRICATION OF A MAGNETIC MINIMOTOR, Eugene J.M. O'Sullivan, Jean Horkans, Lubomyr T. Romankiw, Keith T. Kwietniak, Emanuel I. Cooper, IBM T.J. Watson Research Ctr, Yorktown Heights, NY.
11:45 AM P8.9
ELECTRODEPOSITED TERFENOL FOR MAGNETOSTRICTIVE DEVICES IN MEMS, Anand Natarajan, Wanjun Wang, Michael Murphy, Evan Ma, Louisiana State Univ, Dept of Mechanical Engr, Baton Rouge, LA.
SESSION P9: ELECTRODEPOSITION OF METALS AND ALLOYS FOR MAGNETIC AND ELECTRONIC APPLICATIONS
Chairs: Panos C. Andricacos and Jean Luc Delplancke
Thursday Afternoon, December 5, 1996
Providence/Orleans (M)
1:30 PM *P9.1
CORROSION OF ELECTRONIC AND MAGNETIC DEVICES AND MATERIALS, Gerald S. Frankel, Ohio State Univ, Dept of MS&E, Columbus, OH.
2:00 PM *P9.2
DEFECT STRUCTURE OF ELECTRODEPOSITS, Harish D. Merchant, Gould Inc, Eastlake, OH; Oleg B. Girin, State Metallurgical Academy of Ukraine, Dnepropetrovsk, UKRAINE.
2:30 PM P9.3
ATOMIC FORCE MICROSCOPY STUDY OF SURFACE EVOLUTION DURING ELECTROCRYSTALLIZATION OF ZINC-IRON ALLOYS, F. Czerwinski, Jerzy A. Szpunar, McGill Univ, Dept of Metallurgical Engr, Montreal, CANADA; K. Kondo, Hokkaido Univ, Dept of Materials Science, Sapporo, JAPAN.
2:45 PM BREAK
3:15 PM P9.4
STUDY OF NUCLEATION AND GROWTH OF CU CRYSTALIZATION ON A Pd SUBSTRATE
FROM AN ELECTROLESS Cu BATH USING ATOMIC FORCE MICROSCOPY, Ron Amster, California Polytech State Univ, Dept of Material Sciences, San Luis Obispo, CA; Linda Vanasupa, California Polytech State Univ, Dept of MATE, San Luis Obispo, CA; Brian Johnson, California Polytech State Univ, Dept of Matls Science, San Luis Obispo, CA.
3:30 PM P9.5
NUCLEATION EFFECTS ON THE CRYSTALLIZATION OF ELECTROLESS NICKEL PHOSPHOROUS THIN FILMS, Robert R. Oberle, ENTHONE-OMI, New Haven, CT.
3:45 PM P9.6
ELECTROLESS CoWP BARRIER/PROTECTION LAYER DEPOSITION FOR Cu METALLIZATION, Sergey Lopatin, Cornell Univ, Schoool of Electrical Engineering, Ithaca, NY; Yosi Shacham-Diamand, Cornell Univ, School of Electrical Engr, Ithaca, NY; John Pellerin, SEMATECH Inc, Strategic Technology, Austin, TX; Bin Zhao, SEMATECH Inc, Strategic Tech, Austin, TX; P. Vasudev, SEMATECH Inc, Strategic Technology, Austin, TX; Valery Dubin, Advanced Micro Devices, Sunnyvale, CA.
4:00 PM P9.7
ELECTROCHEMICAL PROCESSING OF DUAL PARTICLE COMPOSITE COATINGS, Cindy Petronis, Katy Barmak, Donald Susan, Steven Banovic, Arnold Marder, Lehigh Univ, Dept of MS&E, Bethlehem, PA.
4:15 PM P9.8
INVESTIGATION OF THE CODEPOSITION OF POLYSTYRENE POLYMETHYLMETHACRYLATE LATICES WITH COPPER ON A ROTATING DISK ELECTRODE, Jan L.D. Fransaer, Harvard Univ, Dept of Art & Sciences, Cambridge, MA; Jean-Pierre Celis, Katholieke Univ Leuven, MTM, Heverlee, BELGIUM.
4:30 PM P9.9
COMPOSITE FILMS OF COPPER/BORON NITRIDE AND NICKEL/BORON NITRIDE, Maria Hepel, Tania Tannehill, Chris Baxter, SUNY-Potsdam, Dept of Chemistry, Potsdam, NY.
4:45 PM P9.10
CHARACTERIZATION OF HIGH STRENGTH Cu/Ag MULTILAYER COMPOSITES, Qing Zhai, Dan Kong, Augusto Morrone, Fereshteh Ebrahimi, Univ of Florida, Dept of MS&E, Gainesville, FL.