Symposium CH01-In Situ Characterization During Thin-Film Processing

Thin films are extremely relevant both scientifically and technologically for several reasons. They provide a model system for studying the fundamental properties of materials, they enable the study of the properties of materials under controlled conditions (including extreme conditions), and they can be used to study the growth and properties of crystals. As a result, thin films find many different applications, including transistors, solar cells, microprocessors, displays, coatings for optical lenses, anti-corrosion coatings, and catalytic converters.

Having the possibility to control their composition and properties during deposition/etch or post deposition treatments offers both fundamental knowledge of the process and accelerates the optimization of the process protocols and the final properties of the materials. For these reasons, in situ characterization techniques are widely used and developed by the thin film community. In addition, data obtained in situ during deposition or post-processing of thin films can be used to accelerate the optimization of deposition/post-treatment conditions and properties thanks to machine learning (ML) and artificial intelligence (AI).

This symposium will bring together researchers using or interested in situ techniques during film processing, who are often dispersed amongst different symposia at application focused conferences, to highlight and discuss recent advancements in the field and to promote cross-fertilization between different in situ approaches.

Topics will include:

  • Nucleation and thin film growth from solutions, melts, and vapors.
  • Novel in situ characterization approaches for thin film deposition and processing
  • In Situ diagnostic of atomic layer processing (ALD, ASD, ALE)
  • In Situ plasma characterization and its correlation to thin films processing (deposition and etching)
  • Optimization of thin film processing through AI/ML and in situ combined approaches
  • In Situ reactor monitoring for control of process uniformity and reproducibility/maintenance
  • In Situ studies in large research facilities (synchrotron, neutrons, etc)
  • In Situ characterization of the evolution of thin films properties during post-deposition treatments

Invited Speakers:

  • Marceline Bonvalot (Commissariat à l’énergie atomique et aux énergies alternatives, France)
  • Christophe Defranoux (Semilab, France)
  • Remy Gassilloud (Commissariat à l’énergie atomique et aux énergies alternatives, France)
  • Agnès Granier (Institut des Materiaux Jean Rouxel, France)
  • Peter Muller-Buschbaum (Technische Universität München, Germany)
  • Kevin Musselman (University of Waterloo, Canada)
  • Shota Nunomura (National Institute of Advanced Industrial Science and Technology, Japan)
  • Robin Ras (Aalto University, Finland)
  • Joachim Schnadt (Lund University, Sweden)
  • Eduardo Solano (ALBA Synchrotron, Spain)
  • Takayoshi Tsutsumi (Nagoya University, Japan)
  • Sergey Voronin (TEL, USA)

Symposium Organizers

David Muñoz-Rojas
Université Grenoble Alpes



Jolien Dendooven
Ghent University
No Phone for Symposium Organizer Provided , [email protected]

Masaru Hori
Nagoya University
No Phone for Symposium Organizer Provided , [email protected]

Christophe Vallée
University at Albany, State University of New York
No Phone for Symposium Organizer Provided , [email protected]

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