Seok-hoon Jeong1,Jong-Whi Park1,Hak-Sung Kim1,2
Hanyang University1,Institute of Nano Science and Technology2
Seok-hoon Jeong1,Jong-Whi Park1,Hak-Sung Kim1,2
Hanyang University1,Institute of Nano Science and Technology2
<b>Abstract</b><br/>Conventional photolithography technology is a technology for manufacturing existing devices, and has disadvantages such as complicated process problems, material loss, and expensive equipment. On the other hand, printed electronics technology is attracting attention because it can easily implement patterns through printing and coating processes using ink and solution materials. The material loss could be reduced through exposure and etching processes for patterning. However, high-temperature and long-term annealing and sintering process were required to realize high quality electrode and semiconductor layer. Accordingly, various annealing/sintering methods have been developed. Among the various methods, the thermal annealing process has disadvantages of complicated facilities for maintain the high temperature and long process time. In the case of laser annealing method, the process time could be shortened, but the disadvantage of the expensive equipment and the small annealing area. In addition, the deep-ultraviolet (UV) irradiation method can also reduce damage to the substrate material, but the process time is long and additional facilities such as inert gas was required. On the other hand, the IPL sintering method can sinter the material of a large area in millisecond units at room temperature and normal pressure using a visible ray xenon lamp. The BaTiO<sub>3</sub> has a high dielectric constant but a relatively low band gap. The low band gap has the disadvantage of a large leakage current, so the other materials, which has the adequate band gap, was used for recent industry. In this study, the disadvantages of BaTiO<sub>3</sub> was compensated by adding the graphene oxide. In addition, the hybrid layer composed of BaTiO<sub>3</sub> and graphene oxide was sintered by using IPL irradiation process. Through various analysis, the sintering characteristics, dielectric properties, and crystallinity of this hybrid layer were investigated.<br/><br/><b>Acknowledgment</b><br/>This work was supported by Korea Institute of Energy Technology Evaluation and Planning(KETEP) grant funded by the Korea government(MOTIE)(20212020800090, Development and Demonstration of Energy-Efficiency Enhanced Technology for Temperature-Controlled Transportation and Logistics Center) and this work was supported by the Korea Institute of Energy Technology Evaluation and Planning(KETEP) and the Ministry of Trade, Industry & Energy(MOTIE) of the Republic of Korea (No. 20206910100160).